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Refinado por: Nome da Publicação: Japanese Journal Of Applied Physics remover
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1
IMPROVED METHOD FOR OBTAINING SINGLE-PHASE Sr2MoO4 UNDER CONTROLLED ULTRALOW OXYGEN PARTIAL PRESSURE
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IMPROVED METHOD FOR OBTAINING SINGLE-PHASE Sr2MoO4 UNDER CONTROLLED ULTRALOW OXYGEN PARTIAL PRESSURE

Shirakawa, N ; Ikeda, S ; Matsuhata, H ; Bando, H

Jpn.J.Appl.Phys ,Part 2. Vol. 40, no. 7B, pp. L741-L743. 2001, 2001-07, Vol.40 (7B), p.L741-L743 [Periódico revisado por pares]

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2
Dependence of Giant Tunnel Magnetoresistance of Sputtered CoFeB/MgO/CoFeB Magnetic Tunnel Junctions on MgO Barrier Thickness and Annealing Temperature
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Dependence of Giant Tunnel Magnetoresistance of Sputtered CoFeB/MgO/CoFeB Magnetic Tunnel Junctions on MgO Barrier Thickness and Annealing Temperature

Hayakawa, Jun ; Ikeda, Shoji ; Matsukura, Fumihiro ; Takahashi, Hiromasa ; Ohno, Hideo

Japanese Journal of Applied Physics, 2005-01, Vol.44 (4L), p.L587 [Periódico revisado por pares]

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3
Current-Driven Magnetization Switching in CoFeB/MgO/CoFeB Magnetic Tunnel Junctions
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Current-Driven Magnetization Switching in CoFeB/MgO/CoFeB Magnetic Tunnel Junctions

Hayakawa, Jun ; Ikeda, Shoji ; Lee, Young Min ; Sasaki, Ryutaro ; Meguro, Toshiyasu ; Matsukura, Fumihiro ; Takahashi, Hiromasa ; Ohno, Hideo

Japanese Journal of Applied Physics, 2005-01, Vol.44 (9L), p.L1267 [Periódico revisado por pares]

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4
Dependence of Tunnel Magnetoresistance in MgO Based Magnetic Tunnel Junctions on Ar Pressure during MgO Sputtering
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Dependence of Tunnel Magnetoresistance in MgO Based Magnetic Tunnel Junctions on Ar Pressure during MgO Sputtering

Ikeda, Shoji ; Hayakawa, Jun ; Lee, Young Min ; Sasaki, Ryutaro ; Meguro, Toshiyasu ; Matsukura, Fumihiro ; Ohno, Hideo

Japanese Journal of Applied Physics, 2005-01, Vol.44 (11L), p.L1442 [Periódico revisado por pares]

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5
XAFS Study with an In Situ Electrochemical Cell on Manganese Schiff Base Complexes as a Model of Photosystem II
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XAFS Study with an In Situ Electrochemical Cell on Manganese Schiff Base Complexes as a Model of Photosystem II

Yamaguchi, T. ; Mitsunaga, T. ; Yoshida, N. ; Wakita, H. ; Fujiwara, M. ; Matsushita, T. ; Ikeda, S. ; Nomura, M.

Japanese Journal of Applied Physics, 1993-01, Vol.32 (S2), p.533 [Periódico revisado por pares]

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6
Tunable Sub-Terahertz Wave Generation from an Organic DAST Crystal
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Tunable Sub-Terahertz Wave Generation from an Organic DAST Crystal

Taniuchi, Tetsuo ; Ikeda, Satoshi ; Okada, Shuji ; Nakanishi, Hachiro

Japanese Journal of Applied Physics, 2005-01, Vol.44 (5L), p.L652 [Periódico revisado por pares]

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7
Fabrication of Nanoparticle Composite Porous Films Having Ultralow Dielectric Constant
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Fabrication of Nanoparticle Composite Porous Films Having Ultralow Dielectric Constant

Nunomura, Shota ; Koga, Kazunori ; Shiratani, Masaharu ; Watanabe, Yukio ; Morisada, Yoshinori ; Matsuki, Nobuo ; Ikeda, Shingo

Japanese Journal of Applied Physics, 2005-01, Vol.44 (12L), p.L1509 [Periódico revisado por pares]

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8
Terahertz Properties of a New Organic Crystal, 4'-Dimethylamino-N-methyl-4-stilbazolium p-Chlorobenzenesulfonate
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Terahertz Properties of a New Organic Crystal, 4'-Dimethylamino-N-methyl-4-stilbazolium p-Chlorobenzenesulfonate

Taniuchi, Tetsuo ; Ikeda, Satoshi ; Mineno, Yoshihiro ; Okada, Shuji ; Nakanishi, Hachiro

Japanese Journal of Applied Physics, 2005-01, Vol.44 (7L), p.L932 [Periódico revisado por pares]

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9
Deoxidization of Cu Oxide under Extremely Low Oxygen Pressure Ambient
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Artigo
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Deoxidization of Cu Oxide under Extremely Low Oxygen Pressure Ambient

Endo, Kazuhiko ; Shirakawa, Naoki ; Yoshida, Yoshiyuki ; Ikeda, Shin-ichi ; Mino, Tetsuya ; Gofuku, Eishi ; Suzuki, Eiichi

Japanese Journal of Applied Physics, 2006-04, Vol.45 (4L), p.L393 [Periódico revisado por pares]

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10
Dependence of Magnetic Properties on Sputtering Pressure for Fe–Al–O Alloy Films Made by Carousel-Type Sputtering
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Dependence of Magnetic Properties on Sputtering Pressure for Fe–Al–O Alloy Films Made by Carousel-Type Sputtering

Uehara, Yuji ; Ikeda, Shoji

Japanese Journal of Applied Physics, 2003, Vol.42 (Part 1, No. 7A), p.4297-4301 [Periódico revisado por pares]

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