Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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0-3 piezoelectric composites for large area hydrophonesGarner, G. M. ; Shorrocks, N. M. ; Whatmore, R. W. ; Goosey, M. T. ; Seth, P. ; Ainger, F. W.Ferroelectrics, 1989-05, Vol.93 (1), p.169-176 [Periódico revisado por pares]Taylor & Francis GroupTexto completo disponível |
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2 |
Material Type: Artigo
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0 - 3 PIEZOELECTRIC - GLASS COMPOSITESSHERRIT, S ; WIEDERICK, HD ; MUKHERJEE, BK ; PRASAD, SEFerroelectrics, 1992-01, Vol.134 (1-4), p.65-69 [Periódico revisado por pares]READING: Taylor & FrancisTexto completo disponível |
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3 |
Material Type: Artigo
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0–3 type Bi3TaTiO9:40wt%BiFeO3 composite with improved high-temperature piezoelectric propertiesQaiser, Muhammad Adnan ; Hussain, Ahmad ; Zhang, Ji ; Wang, Yaojin ; Zhang, Shantao ; Chen, Lang ; Yuan, GuoliangJournal of alloys and compounds, 2018-04, Vol.740, p.1-6 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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4 |
Material Type: Artigo
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[001]-oriented crystalline Potassium-Sodium Niobate thin film fabricated at low temperature for use in piezoelectric energy harvesterKim, Jong-Hyun ; Woo, Jong-Un ; Yee, Yeon-Jeong ; Kim, In-Su ; Shin, Ho-Sung ; Hwang, Hyun-Gyu ; Kweon, Sang Hyo ; Choi, Hyun-Ju ; Nahm, SahnApplied surface science, 2021-01, Vol.537, p.147871, Article 147871 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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5 |
Material Type: Ata de Congresso
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0.12 micron logic process using a 248 nm step-and-scan systemBAKER, Dan ; ZHENG, Tammy ; TAKEMOTO, Cliff ; SETHI, Satyendra ; GABRIEL, Calvin ; SCOTT, GregSPIE proceedings series, 2000, p.294-304Bellingham WA: SPIETexto completo disponível |
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6 |
Material Type: Ata de Congresso
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0.13-μm optical lithography for random logic devices using 248-nm attenuated phase-shifting masksChen, Yung-Tin ; Lin, Chia-Hui ; Lin, Hua Tai ; Hsieh, Hung-Chang ; Yu, Shinn Sheng ; Yen, AnthonySPIE 2000Texto completo disponível |
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7 |
Material Type: Ata de Congresso
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0.18-μm optical lithography performances using an alternating DUV phase-shift maskTrouiller, Yorick ; Buffet, N ; Mourier, Thierry ; Schiavone, Patrick ; Quere, YvesSPIE proceedings series, 1998, Vol.3334, p.25-35Bellingham WA: SPIETexto completo disponível |
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8 |
Material Type: Artigo
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0.25 μm trilevel lithography using KTI 747 negative resist for the planarizing layerKUNG, E. H ; TIMKO, A. GJournal of the Electrochemical Society, 1990-11, Vol.137 (11), p.3568-3573 [Periódico revisado por pares]Pennington, NJ: Electrochemical SocietyTexto completo disponível |
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9 |
Material Type: Artigo
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0.279 nW fourth-order filter circuit for biological signal conditioningThakur, Diksha ; Sharma, KulbhushanAIP advances, 2024-06, Vol.14 (6), p.065110-065110-13 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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10 |
Material Type: Artigo
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0.3-10.0 THz spectra for chosen liquid crystal molecules - simulation and physical propertiesParka, Janusz ; Sielezin, KarolMolecular Crystals and Liquid Crystals, 2017-11, Vol.657 (1), p.66-71 [Periódico revisado por pares]Philadelphia: Taylor & FrancisTexto completo disponível |