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Refinado por: Base de dados/Biblioteca: Aerospace Database remover Nome da Publicação: Thin Solid Films remover
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PbTe films grown by hot wall epitaxy on sapphire substrates
PbTe films grown by hot wall epitaxy on sapphire substrates
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PbTe films grown by hot wall epitaxy on sapphire substrates

Dashevsky, Z ; Belenchuk, A ; Gartstein, E ; Shapoval, O

Thin solid films, 2004-08, Vol.461 (2), p.256-265 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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2
Adhesion studies of low- k silsesquioxane
Adhesion studies of low- k silsesquioxane
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Adhesion studies of low- k silsesquioxane

Cheng, Yao-Yi ; Kan, Jiuq Yi ; Lin, I-Shun

Thin solid films, 2004-09, Vol.462 (Complete), p.297-301 [Periódico revisado por pares]

Elsevier B.V

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3
Comparative studies of physical and chemical properties of plasma-treated CVD low k SiOCH dielectrics
Comparative studies of physical and chemical properties of plasma-treated CVD low k SiOCH dielectrics
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Comparative studies of physical and chemical properties of plasma-treated CVD low k SiOCH dielectrics

Tsang, C.F. ; Su, Y.J. ; Bliznetsov, V.N.

Thin solid films, 2004-09, Vol.462 (Complete), p.269-274 [Periódico revisado por pares]

Elsevier B.V

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4
Preparation of LaNiO3 thin films by mist plasma evaporation
Preparation of LaNiO3 thin films by mist plasma evaporation
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Preparation of LaNiO3 thin films by mist plasma evaporation

Huang, H ; Yao, X

Thin solid films, 2004-09, Vol.462-463 (Complete), p.123-126 [Periódico revisado por pares]

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5
Comparative study of argon and hydrogen/helium plasma treatments on the properties of Cu/SiLK damascene structures for interconnect technology
Comparative study of argon and hydrogen/helium plasma treatments on the properties of Cu/SiLK damascene structures for interconnect technology
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Comparative study of argon and hydrogen/helium plasma treatments on the properties of Cu/SiLK damascene structures for interconnect technology

Li, C.Y. ; Zhang, D.H. ; Su, S.S. ; Lu, P.W. ; He, X. ; Jia, G.J. ; Chen, Zhe ; Wu, S.Y. ; Kumar, Rakesh

Thin solid films, 2004-09, Vol.462 (Complete), p.172-175 [Periódico revisado por pares]

Elsevier B.V

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6
Fullerene negative ion irradiation toward double-walled carbon nanotubes using low energy magnetized plasma
Fullerene negative ion irradiation toward double-walled carbon nanotubes using low energy magnetized plasma
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Fullerene negative ion irradiation toward double-walled carbon nanotubes using low energy magnetized plasma

Jeong, G.-H. ; Okada, T. ; Hirata, T. ; Hatakeyama, R. ; Tohji, K.

Thin solid films, 2004-10, Vol.464 (Complete), p.299-303 [Periódico revisado por pares]

Elsevier B.V

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7
Synthesis of conical Si array on Si(100) for a field electron emitter by plasma-enhanced chemical vapor deposition
Synthesis of conical Si array on Si(100) for a field electron emitter by plasma-enhanced chemical vapor deposition
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Synthesis of conical Si array on Si(100) for a field electron emitter by plasma-enhanced chemical vapor deposition

Lee, Kuei-Yi ; Honda, Shin-ichi ; Katayama, Mitsuhiro ; Kuzuoka, Takashi ; Baek, Yang-Gyu ; Ohkura, Shigeharu ; Aoki, Katsunori ; Hirao, Takashi ; Oura, Kenjiro

Thin solid films, 2004-10, Vol.464 (Complete), p.194-198 [Periódico revisado por pares]

Elsevier B.V

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8
Synthesis of highly oriented and dense conical carbon nanofibers by a DC bias-enhanced microwave plasma CVD method
Synthesis of highly oriented and dense conical carbon nanofibers by a DC bias-enhanced microwave plasma CVD method
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Synthesis of highly oriented and dense conical carbon nanofibers by a DC bias-enhanced microwave plasma CVD method

Zhong, Goufang ; Iwasaki, Takayuki ; Kawarada, Hiroshi ; Ohdomari, Iwao

Thin solid films, 2004-10, Vol.464 (Complete), p.315-318 [Periódico revisado por pares]

Elsevier B.V

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9
Oxygen-plasma induced hydrogen desorption from hydrogen-terminated Si(100) and (111) surfaces investigated by infrared spectroscopy
Oxygen-plasma induced hydrogen desorption from hydrogen-terminated Si(100) and (111) surfaces investigated by infrared spectroscopy
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Oxygen-plasma induced hydrogen desorption from hydrogen-terminated Si(100) and (111) surfaces investigated by infrared spectroscopy

Shinohara, Masanori ; Katagiri, Teruaki ; Iwatsuji, Keitaro ; Matsuda, Yoshinobu ; Fujiyama, Hiroshi ; Kimura, Yasuo ; Niwano, Michio

Thin solid films, 2004-10, Vol.464 (Complete), p.14-17 [Periódico revisado por pares]

Elsevier B.V

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10
Surface plasma wave interactions between semiconductor and electromagnetic space harmonics from microwave to THz range
Surface plasma wave interactions between semiconductor and electromagnetic space harmonics from microwave to THz range
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Surface plasma wave interactions between semiconductor and electromagnetic space harmonics from microwave to THz range

Iizuka, Kouichi ; Hashim, Abdul Manaf Bin ; Hasegawa, Hideki

Thin solid films, 2004-10, Vol.464 (Complete), p.464-468 [Periódico revisado por pares]

Elsevier B.V

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