Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Growth kinetics and structure formation of ZrO2 thin films in chloride-based atomic layer deposition processAARIK, Jaan ; AIDLA, Aleks ; MÄNDAR, Hugo ; UUSTARE, Teet ; SAMMELSELG, VäinoThin solid films, 2002-04, Vol.408 (1-2), p.97-103 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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2 |
Material Type: Artigo
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Optical characterization of HfO2 thin films grown by atomic layer depositionAARIK, Jaan ; MÄNDAR, Hugo ; KIRM, Marco ; PUNG, LembitThin solid films, 2004-11, Vol.466 (1-2), p.41-47 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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3 |
Material Type: Artigo
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Hafnium tetraiodide and oxygen as precursors for atomic layer deposition of hafnium oxide thin filmsAarik, Jaan ; Sundqvist, Jonas ; Aidla, Aleks ; Lu, Jun ; Sajavaara, Timo ; Kukli, Kaupo ; Hårsta, AndersThin solid films, 2002-10, Vol.418 (2), p.69-72 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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4 |
Material Type: Artigo
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Real-time study of HWCVD a-Si:H film growth using optical second harmonic generation spectroscopyAarts, I.M.P. ; Gielis, J.J.H. ; Grauls, P.M.J. ; Leewis, C.M. ; van de Sanden, M.C.M. ; Kessels, W.M.M.Thin solid films, 2006-04, Vol.501 (1), p.70-74 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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5 |
Material Type: Artigo
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Buckle morphology of compressed inorganic thin layers on a polymer substrateAbdallah, A.A. ; Kozodaev, D. ; Bouten, P.C.P. ; den Toonder, J.M.J. ; Schubert, U.S. ; de With, G.Thin solid films, 2006-05, Vol.503 (1-2), p.167-176 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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6 |
Material Type: Artigo
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Silicon nano-crystalline structures fabricated by a sequential plasma hydrogenation and annealing techniqueAbdi, Y. ; Hashemi, P. ; Mohajerzadeh, S. ; Jamei, M. ; Robertson, M.D. ; Burns, M.J. ; MacLachlan, J.M.Thin solid films, 2008-03, Vol.516 (10), p.3172-3178 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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7 |
Material Type: Artigo
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Optical characterization by variable angle spectroscopic ellipsometry of nitrogen-doped MgxZn1−xO thin films prepared by the plasma-assisted reactive evaporation methodAbe, Takami ; Nakagawa, Akira ; Nakagawa, Michiko ; Chiba, Tetsuya ; Takahashi, Shuzo ; Kashiwaba, Yasuhiro ; Chiba, Shigeki ; Ojima, Tsutomu ; Aota, Katsumi ; Daibo, Masahiro ; Osada, Hiroshi ; Fujiwara, Tamiya ; Niikura, Ikuo ; Kashiwaba, Yasube ; Tsutsumi, Kouichi ; Suzuki, MichioThin solid films, 2014-11, Vol.571, p.615-619 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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8 |
Material Type: Artigo
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Effect of deposition parameters on the properties of amorphous silicon-germanium alloy films growtn by the photo-CVD methodABHIJIT DE ; SWATI RAY ; BARUA, A. KThin solid films, 1993, Vol.229 (2), p.216-222 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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9 |
Material Type: Artigo
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Localized deposition of hydrocarbon using plasma activated chemical vapour depositionAbhinandan, Lala ; Holländer, AndreasThin solid films, 2004-06, Vol.457 (2), p.241-245 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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10 |
Material Type: Artigo
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Crystalline phase control and growth selectivity of β-MnO2 thin films by remote plasma assisted pulsed laser depositionAbi-Akl, M. ; Tabbal, M. ; Kassem, W.Thin solid films, 2016-08, Vol.612, p.450-455 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |