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Ion tracks and microtechnology principles and applications
Ion tracks and microtechnology principles and applications
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Ion tracks and microtechnology principles and applications

Reimar Spohr Klaus Bethge 1931-

Braunschweig Vieweg c1990

Localização: FFCLRP - Fac. Fil. Ciên. Let. de R. Preto    (537.561 S762i e.2 )(Acessar)

2
Papers from the 50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
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Papers from the 50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (50th : 2006 : Baltimore, Md.) Shalom J Wind; American Vacuum Society.; IEEE Electron Devices Society.; Optical Society of America.

Melville, N.Y. : AVS through the American Institute of Physics c2006

Localização: IF - Instituto de Física    (J.Vac.Sci.Technol.A v.24 n.6 )(Acessar)

3
Electron, ion, and photon beam technology and nanofabrication
Electron, ion, and photon beam technology and nanofabrication
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Electron, ion, and photon beam technology and nanofabrication

International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (51st 2007 Denver, CO)

Journal of Vacuum Science & Technology B 2nd ser., v. 25, no.6, 2007

Melville, N.Y. American Institute of Physics 2007

Localização: IF - Instituto de Física    (J.Vac.Sci.Technol. v.25(6)2007 )(Acessar)

4
Tailored Optical Functionality by Combining Electron‐Beam and Focused Gold‐Ion Beam Lithography for Solid and Inverse Coupled Plasmonic Nanostructures
Tailored Optical Functionality by Combining Electron‐Beam and Focused Gold‐Ion Beam Lithography for Solid and Inverse Coupled Plasmonic Nanostructures
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Tailored Optical Functionality by Combining Electron‐Beam and Focused Gold‐Ion Beam Lithography for Solid and Inverse Coupled Plasmonic Nanostructures

Hentschel, Mario ; Karst, Julian ; Giessen, Harald

Advanced optical materials, 2020-10, Vol.8 (19), p.n/a

Weinheim: Wiley Subscription Services, Inc

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5
Methods and Materials in Microelectronic Technology
Methods and Materials in Microelectronic Technology
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Methods and Materials in Microelectronic Technology

Bargon, Joachim

New York, NY: Springer 1984

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6
Shrinkage Precompensation of Holographic Three-Dimensional Photonic-Crystal Templates
Shrinkage Precompensation of Holographic Three-Dimensional Photonic-Crystal Templates
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Shrinkage Precompensation of Holographic Three-Dimensional Photonic-Crystal Templates

Meisel, D. C. ; Diem, M. ; Deubel, M. ; Pérez-Willard, F. ; Linden, S. ; Gerthsen, D. ; Busch, K. ; Wegener, M.

Advanced materials (Weinheim), 2006-11, Vol.18 (22), p.2964-2968 [Periódico revisado por pares]

Weinheim: WILEY-VCH Verlag

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7
Focused-Ion-Beam-Based Selective Closing and Opening of Anodic Alumina Nanochannels for the Growth of Nanowire Arrays Comprising Multiple Elements
Focused-Ion-Beam-Based Selective Closing and Opening of Anodic Alumina Nanochannels for the Growth of Nanowire Arrays Comprising Multiple Elements
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Focused-Ion-Beam-Based Selective Closing and Opening of Anodic Alumina Nanochannels for the Growth of Nanowire Arrays Comprising Multiple Elements

Liu, Nai-Wei ; Liu, Chih-Yi ; Wang, Huai-Hsien ; Hsu, Chen-Feng ; Lai, Ming-Yu ; Chuang, Tung-Han ; Wang, Yuh-Lin

Advanced materials (Weinheim), 2008-07, Vol.20 (13), p.2547-2551 [Periódico revisado por pares]

Weinheim: WILEY-VCH Verlag

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8
Methodologies for Detecting Quantal Exocytosis in Adrenal Chromaffin Cells Through Diamond-Based MEAs
Methodologies for Detecting Quantal Exocytosis in Adrenal Chromaffin Cells Through Diamond-Based MEAs
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Methodologies for Detecting Quantal Exocytosis in Adrenal Chromaffin Cells Through Diamond-Based MEAs

Tomagra, Giulia ; Franchino, Claudio ; Carbone, Emilio ; Marcantoni, Andrea ; Pasquarelli, Alberto ; Picollo, Federico ; Carabelli, Valentina

Chromaffin Cells, 2023-01, Vol.2565, p.213-221

New York, NY: Springer US

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9
Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)
Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)
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Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)

Gorelick, S. ; Puttaraksa, N. ; Sajavaara, T. ; Laitinen, M. ; Singkarat, S. ; Whitlow, H.J.

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2008-05, Vol.266 (10), p.2461-2465 [Periódico revisado por pares]

Elsevier B.V

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10
Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography
Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography
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Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography

Abbas, Ahmad N ; Liu, Gang ; Liu, Bilu ; Zhang, Luyao ; Liu, He ; Ohlberg, Douglas ; Wu, Wei ; Zhou, Chongwu

ACS nano, 2014-02, Vol.8 (2), p.1538-1546 [Periódico revisado por pares]

United States: American Chemical Society

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