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Hollow-cathode chemical vapor deposition of thick, low-stress diamond-like carbon films

Miller, J. ; Ceballos, A. ; Bayu Aji, L.B. ; Moore, A. ; Wasz, C. ; Kucheyev, S.O. ; Elhadj, S. ; Falabella, S.

Thin solid films, 2020-11, Vol.714 (na), p.138394, Article 138394 [Periódico revisado por pares]

United States: Elsevier B.V

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  • Título:
    Hollow-cathode chemical vapor deposition of thick, low-stress diamond-like carbon films
  • Autor: Miller, J. ; Ceballos, A. ; Bayu Aji, L.B. ; Moore, A. ; Wasz, C. ; Kucheyev, S.O. ; Elhadj, S. ; Falabella, S.
  • Assuntos: Amorphous hydrogenated carbon ; Coatings ; condensed matter physics ; Diamond-like carbon ; MATERIALS SCIENCE ; nanoscience and nanotechnology ; Plasma chemical vapor deposition ; plasma physics ; solid state physics
  • É parte de: Thin solid films, 2020-11, Vol.714 (na), p.138394, Article 138394
  • Notas: AC52-07NA27344
    USDOE National Nuclear Security Administration (NNSA)
    LLNL-JRNL-804133
  • Descrição: •Smooth, low-stress, amorphous hydrogenated carbon films via plasma chemical vapor deposition.•Higher density films grown when using Ar plasma compared to N2 or H2 plasma.•Plasma confinement via a magnetic field suggests improved gas ionization. A radio-frequency (RF), hollow-cathode plasma source with confining magnetic field is described for the chemical vapor deposition of thick ( >  10 µm), amorphous diamond-like carbon ablator films for inertial confinement fusion applications. Plasma is characterized by optical emission spectroscopy, while properties of the resultant films are measured by a combination of profilometry, Rutherford backscattering spectrometry, elastic recoil detection analysis, X-ray diffraction, Raman spectroscopy, and atomic force microscopy. The dependence of the deposition rate, film density, elemental composition, self-bias and residual stress is reported as a function of RF power. Higher density films were found when using Ar plasma, than N2 or H2 plasma. The coatings produced are x-ray amorphous, exhibit low compressive stress ( ~ 100 MPa), high density ( < 1.7 g/cm3), hydrogen content of  ~ 30 at.%, and a low average roughness of 0.75 nm. Applications of these films as tunable-density ablators for inertial confinement fusion experiments are discussed.
  • Editor: United States: Elsevier B.V
  • Idioma: Inglês
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  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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