Sputter deposition from a Ti2AlC target: Process characterization and conditions for growth of Ti2AlC
FRODELIUS, J ; EKLUND, P ; BECKERS, M ; PERSSON, P. O. A ; HÖGBERG, H ; HULTMAN, L
Thin solid films, 2010, Vol.518 (6), p.1621-1626
[Peer Reviewed Journal]
Amsterdam: Elsevier
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