Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide

Tak, Hyun Woo ; Lee, Hye Joo ; Wen, Long ; Kang, Byung Jin ; Sung, Dain ; Bae, Jeong Woon ; Kim, Dong Woo ; Lee, Wonseok ; Lee, Seung Bae ; Kim, Keunsuk ; Cho, Byeong Ok ; Kim, Young Lea ; Song, Han Dock ; Yeom, Geun Young

Applied surface science, 2022-10, Vol.600, p.154050, Article 154050 [Periódico revisado por pares]

Elsevier B.V

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