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Liquid metal ion source and alloy for ion emission of multiple ionic species

Clark, Jr., William M. ; Utlaut, Mark W ; Wysocki, Joseph A ; Storms, Edmund K ; Szklarz, Eugene G ; Behrens, Robert G ; Swanson, Lynwood W ; Bell, Anthony E

United States 1987

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Título:
Liquid metal ion source and alloy for ion emission of multiple ionic species
Autor: Clark, Jr., William M. ; Utlaut, Mark W ; Wysocki, Joseph A ; Storms, Edmund K ; Szklarz, Eugene G ; Behrens, Robert G ; Swanson, Lynwood W ; Bell, Anthony E
Assuntos: 313/250 ; alloy ; alloys ; arsenic ; beams ; boron ; circuit ; circuit device ; circuit devices ; constructed ; contained ; continuous ; corrosion ; currents ; desired ; devices ; element ; emission ; emit ; emitter ; evaporated ; evaporation ; experience ; fabricated ; heater ; heater element ; implantation ; including ; integrated ; integrated circuit ; ionic ; ionic species ; lifetimes ; liquid ; liquid metal ; means ; metal ; multiple ; needle ; operating ; operating life ; operating lifetime ; operating lifetimes ; operation ; palladium-arsenic-boron ; palladium-arsenic-boron-phosphorus ; phosphorus ; preferably ; preferably constructed ; preparing ; readily ; rhenium ; semiconductor ; semiconductor wafer ; semiconductor wafers ; simultaneous ; source ; source means ; sources ; species ; stable ; sufficiently ; tungsten ; u-shaped ; useful ; wafers
Notas: 83F842300
Descrição: A liquid metal ion source and alloy for the simultaneous ion evaporation of arsenic and boron, arsenic and phosphorus, or arsenic, boron and phosphorus. The ionic species to be evaporated are contained in palladium-arsenic-boron and palladium-arsenic-boron-phosphorus alloys. The ion source, including an emitter means such as a needle emitter and a source means such as U-shaped heater element, is preferably constructed of rhenium and tungsten, both of which are readily fabricated. The ion sources emit continuous beams of ions having sufficiently high currents of the desired species to be useful in ion implantation of semiconductor wafers for preparing integrated circuit devices. The sources are stable in operation, experience little corrosion during operation, and have long operating lifetimes.
Editor: United States
Data de criação/publicação: 1987
Idioma: Inglês

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Liquid metal ion source and alloy for ion emission of multiple ionic species

Clark, Jr., William M. ; Utlaut, Mark W ; Wysocki, Joseph A ; Storms, Edmund K ; Szklarz, Eugene G ; Behrens, Robert G ; Swanson, Lynwood W ; Bell, Anthony E

United States 1987

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