Carbon contamination in an etching reactor using electron cyclotron resonance plasma and the effect of a N 2 addition
Miwa, Kazuhiro ; Aoyama, Masaaki ; Higuchi, Kenichi ; Inoue, Minoru ; Kojiri, Hidehiro ; Nagase, Kunihiko
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1997, Vol.15 (3), p.1413-1417 [Periódico revisado por pares]Texto completo disponível