Characteristics of metal-insulator-semiconductor capacitors based on high- k HfAlO dielectric films obtained by low-temperature electron-beam gun evaporation

Mikhelashvili, V ; Brener, R ; Kreinin, O ; Meyler, B ; Shneider, J ; Eisenstein, G

Applied physics letters, 2004-12, Vol.85 (24), p.5950-5952 [Periódico revisado por pares]

American Institute of Physics

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