FORMULAE FOR MAXIMUM ESCAPE DEPTH OF REDIFFUSED ELECTRONS AND BACKSCATTERING COEFFICIENT OF METAL FILMS

XIE, A. G ; LIU, H. Y ; YU, Y ; XIA, Y. Q ; WAN, T. Y

Surface review and letters, 2018-02, Vol.25 (2), p.1850047 [Periódico revisado por pares]

Singapore: World Scientific Publishing Company

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