Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Dataset
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1_SequenceWeyrich, Laura ; Duchene, Sebastian ; Soubrier, Julien ; Arriola, Luis ; Llamas, Bastien ; Breen, James ; Morris, Alan G ; Alt, Kurt W ; Caramelli, David ; Dresely, Veit ; Farrell, Milly ; Farrer, Andrew G ; Francken, Michael ; Gully, Neville ; Haak, Wolfgang ; Hardy, Karen ; Harvati, Katerina ; Held, Petra ; Holmes, Edward C ; Kaidonis, John ; Krause, Johannes ; Lalueza Fox, Carles ; De La Rasilla, Marco ; Rosas, Antonio ; Semal, Patrick ; Soltysiak, Arkadiusz ; Townsend, Grant ; Usai, Donatella ; Wahl, Joachim ; Huson, Daniel ; Dobney, Keith ; Cooper, AlanOnline Ancient Genome Repository 2016Texto completo disponível |
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2 |
Material Type: Artigo
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14.sup.th century Yersinia pestis genomes support emergence of pestis secunda within EuropeParker, Cody E ; Hiss, Alina N ; Spyrou, Maria A ; Neumann, Gunnar U ; Slavin, Philip ; Nelson, Elizabeth A ; Nagel, Sarah ; Dalidowski, Xandra ; Friederich, Susanne ; Krause, Johannes ; Herbig, Alexander ; Haak, Wolfgang ; Bos, Kirsten IPLoS pathogens, 2023-07, Vol.19 (7), p.e1011404 [Periódico revisado por pares]Public Library of ScienceTexto completo disponível |
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3 |
Material Type: Artigo
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14th century Yersinia pestis genomes support emergence of pestis secunda within EuropeParker, Cody E ; Hiss, Alina N ; Spyrou, Maria A ; Neumann, Gunnar U ; Slavin, Philip ; Nelson, Elizabeth A ; Nagel, Sarah ; Dalidowski, Xandra ; Friederich, Susanne ; Krause, Johannes ; Herbig, Alexander ; Haak, Wolfgang ; Bos, Kirsten I Falush, DanielPLoS pathogens, 2023-07, Vol.19 (7), p.e1011404-e1011404 [Periódico revisado por pares]United States: Public Library of ScienceTexto completo disponível |
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4 |
Material Type: Dataset
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2_ProcessedWeyrich, Laura ; Duchene, Sebastian ; Soubrier, Julien ; Arriola, Luis ; Llamas, Bastien ; Breen, James ; Morris, Alan G ; Alt, Kurt W ; Caramelli, David ; Dresely, Veit ; Farrell, Milly ; Farrer, Andrew G ; Francken, Michael ; Gully, Neville ; Haak, Wolfgang ; Hardy, Karen ; Harvati, Katerina ; Held, Petra ; Holmes, Edward C ; Kaidonis, John ; Krause, Johannes ; Lalueza Fox, Carles ; De La Rasilla, Marco ; Rosas, Antonio ; Semal, Patrick ; Soltysiak, Arkadiusz ; Townsend, Grant ; Usai, Donatella ; Wahl, Joachim ; Huson, Daniel ; Dobney, Keith ; Cooper, AlanOnline Ancient Genome Repository 2016Texto completo disponível |
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5 |
Material Type: Dataset
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2017_AHP_mtDNATobler, Ray ; Rohrlach, Adam ; Soubrier, Julien ; Bover, Pere ; Llamas, Bastien ; Tuke, Jonathan ; Bean, Nigel ; Abdullah-Highfold, Ali ; Agius, Shane ; O’Donoghue, Amy ; O’Loughlin, Isabel ; Sutton, Peter ; Zilio, Fran ; Walshe, Keryn ; Williams, Alan ; Turney, Chris ; Williams, Matthew ; Richards, Stephen ; Mitchell, Robert ; Kowal, Emma ; Stephen, John ; Williams, Lesley ; Haak, Wolfgang ; Cooper, AlanOnline Ancient Genome Repository 2017Texto completo disponível |
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6 |
Material Type: Dataset
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3_AnalysisWeyrich, Laura ; Duchene, Sebastian ; Soubrier, Julien ; Arriola, Luis ; Llamas, Bastien ; Breen, James ; Morris, Alan G ; Alt, Kurt W ; Caramelli, David ; Dresely, Veit ; Farrell, Milly ; Farrer, Andrew G ; Francken, Michael ; Gully, Neville ; Haak, Wolfgang ; Hardy, Karen ; Harvati, Katerina ; Held, Petra ; Holmes, Edward C ; Kaidonis, John ; Krause, Johannes ; Lalueza Fox, Carles ; De La Rasilla, Marco ; Rosas, Antonio ; Semal, Patrick ; Soltysiak, Arkadiusz ; Townsend, Grant ; Usai, Donatella ; Wahl, Joachim ; Huson, Daniel ; Dobney, Keith ; Cooper, AlanOnline Ancient Genome Repository 2016Texto completo disponível |
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7 |
Material Type: Artigo
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A 0.13 [Formula Omitted] SiGe BiCMOS Technology Featuring f[Formula Omitted]/f[Formula Omitted] of 240/330 GHz and Gate Delays Below 3 psRucker, Holger ; Heinemann, Bernd ; Winkler, Wolfgang ; Barth, R ; Borngraber, J ; Drews, J ; Fischer, Gerhard G ; Fox, Alexander ; Grabolla, Thomas ; Haak, U ; Knoll, Dieter ; Korndorfer, Falk ; Mai, Andreas ; Marschmeyer, Steffen ; Schley, P ; Schmidt, D ; Schmidt, J ; Schubert, Markus Andreas ; Schulz, K ; Tillack, Bernd ; Wolansky, D ; Yamamoto, YujiIEEE journal of solid-state circuits, 2010-09, Vol.45 (9), p.1678 [Periódico revisado por pares]New York: The Institute of Electrical and Electronics Engineers, Inc. (IEEE)Texto completo disponível |
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8 |
Material Type: Artigo
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A 0.13 mu hbox m SiGe BiCMOS Technology Featuring f T /f max of 240/330 GHz and Gate Delays Below 3 psRucker, Holger ; Heinemann, Bernd ; Winkler, Wolfgang ; Barth, R ; Borngraber, J ; Drews, J ; Fischer, Gerhard G ; Fox, Alexander ; Grabolla, Thomas ; Haak, U ; Knoll, Dieter ; Korndorfer, Falk ; Mai, Andreas ; Marschmeyer, Steffen ; Schley, P ; Schmidt, D ; Schmidt, J ; Schubert, Markus Andreas ; Schulz, K ; Tillack, Bernd ; Wolansky, D ; Yamamoto, YujiIEEE journal of solid-state circuits, 2010-09, Vol.45 (9), p.1678-1686 [Periódico revisado por pares]Texto completo disponível |
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9 |
Material Type: Artigo
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A 0.13 \mu} SiGe BiCMOS Technology Featuring f /f of 240/330 GHz and Gate Delays Below 3 psRücker, Holger ; Heinemann, Bernd ; Winkler, Wolfgang ; Barth, R ; Borngraber, J ; Drews, J ; Fischer, Gerhard G ; Fox, Alexander ; Grabolla, Thomas ; Haak, U ; Knoll, Dieter ; Korndörfer, Falk ; Mai, Andreas ; Marschmeyer, Steffen ; Schley, P ; Schmidt, D ; Schmidt, J ; Schubert, Markus Andreas ; Schulz, K ; Tillack, Bernd ; Wolansky, D ; Yamamoto, YujiIEEE journal of solid-state circuits, 2010-09, Vol.45 (9), p.1678-1686 [Periódico revisado por pares]IEEETexto completo disponível |
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10 |
Material Type: Artigo
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A 0.13 μm SiGe BiCMOS Technology Featuring fT/fmax of 240/330 GHz and Gate Delays Below 3 ps : The 23rd bipolar/BICMOS circuits and technology meetingRÜCKER, Holger ; HEINEMANN, Bernd ; KNOLL, Dieter ; KORNDÖRFER, Falk ; MAI, Andreas ; MARSCHMEYER, Steffen ; SCHLEY, P ; SCHMIDT, D ; SCHMIDT, J ; ANDREAS SCHUBERT, Markus ; SCHULZ, K ; TILLACK, Bernd ; WINKLER, Wolfgang ; WOLANSKY, D ; YAMAMOTO, Yuji ; BARTH, R ; BORNGRÄBER, J ; DREWS, J ; FISCHER, Gerhard G ; FOX, Alexander ; GRABOLLA, Thomas ; HAAK, UIEEE journal of solid-state circuits, 2010, Vol.45 (9), p.1678-1686 [Periódico revisado por pares]New York, NY: Institute of Electrical and Electronics EngineersTexto completo disponível |