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1‐nm Si Patterning: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52/2019)
1‐nm Si Patterning: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52/2019)
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1‐nm Si Patterning: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52/2019)

Manfrinato, Vitor R. ; Camino, Fernando E. ; Stein, Aaron ; Zhang, Lihua ; Lu, Ming ; Stach, Eric A. ; Black, Charles T.

Advanced functional materials, 2019-12, Vol.29 (52), p.n/a [Periódico revisado por pares]

Hoboken: Wiley Subscription Services, Inc

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2
20 nm electron beam lithography and reactive ion etching for the fabrication of double gate FinFET devices
20 nm electron beam lithography and reactive ion etching for the fabrication of double gate FinFET devices
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20 nm electron beam lithography and reactive ion etching for the fabrication of double gate FinFET devices

Kretz, J. ; Dreeskornfeld, L. ; Hartwich, J. ; Rösner, W.

Microelectronic engineering, 2003-06, Vol.67, p.763-768 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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3
20 years of Microprocesses and Nanotechinology Conference
20 years of Microprocesses and Nanotechinology Conference
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20 years of Microprocesses and Nanotechinology Conference

Ishihara, S. ; Okazaki, S. ; Arimoto, H.

2007 Digest of papers Microprocesses and Nanotechnology, 2007, p.2-2

IEEE

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4
22 GHz direct-modulated weakly coupled DBR-laser fabricated by focused ion beam lithography
22 GHz direct-modulated weakly coupled DBR-laser fabricated by focused ion beam lithography
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22 GHz direct-modulated weakly coupled DBR-laser fabricated by focused ion beam lithography

Bach, L. ; Kaiser, W. ; Reithmaier, J.P. ; Forchel, A. ; Gioannini, M. ; Feies, V. ; Montrosset, I.

International Conference onIndium Phosphide and Related Materials, 2003, 2003, p.190-193

IEEE

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5
22-GHz modulation bandwidth of long cavity DBR laser by using a weakly laterally coupled grating fabricated by focused ion beam lithography
22-GHz modulation bandwidth of long cavity DBR laser by using a weakly laterally coupled grating fabricated by focused ion beam lithography
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22-GHz modulation bandwidth of long cavity DBR laser by using a weakly laterally coupled grating fabricated by focused ion beam lithography

Bach, L. ; Kaiser, W. ; Reithmaier, J.P. ; Forchel, A. ; Gioannini, M. ; Feies, V. ; Montrosset, I.

IEEE photonics technology letters, 2004-01, Vol.16 (1), p.18-20

New York: IEEE

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6
2DEG base hot electron transistors fabricated using MBE and in situ ion beam lithography
2DEG base hot electron transistors fabricated using MBE and in situ ion beam lithography
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2DEG base hot electron transistors fabricated using MBE and in situ ion beam lithography

Ingram, S.G. ; Linfield, E.H. ; Brown, K.M. ; Jones, G.A.C. ; Ritchie, D.A. ; Kelly, M.J.

IEEE transactions on electron devices, 1995-06, Vol.42 (6), p.1065-1069 [Periódico revisado por pares]

IEEE

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7
30 GHz surface acoustic wave transducers with extremely high mass sensitivity
30 GHz surface acoustic wave transducers with extremely high mass sensitivity
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30 GHz surface acoustic wave transducers with extremely high mass sensitivity

Zheng, Jiangpo ; Zhou, Jian ; Zeng, Pei ; Liu, Yi ; Shen, Yiping ; Yao, Wenze ; Chen, Zhe ; Wu, Jianhui ; Xiong, Shuo ; Chen, Yiqin ; Shi, Xianglong ; Liu, Jie ; Fu, Yongqing ; Duan, Huigao

Applied physics letters, 2020-03, Vol.116 (12) [Periódico revisado por pares]

Melville: American Institute of Physics

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8
3D Femtosecond Laser Submicron Lithography as a Way of Fabricating Spiral Phase Plates for Forming Photon Beams with Orbital Angular Momentum
3D Femtosecond Laser Submicron Lithography as a Way of Fabricating Spiral Phase Plates for Forming Photon Beams with Orbital Angular Momentum
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3D Femtosecond Laser Submicron Lithography as a Way of Fabricating Spiral Phase Plates for Forming Photon Beams with Orbital Angular Momentum

Demenev, A. A. ; Kovalchuk, A. V. ; Polushkin, E. A. ; Shapoval, S. Yu

Bulletin of the Russian Academy of Sciences. Physics, 2021-02, Vol.85 (2), p.159-164 [Periódico revisado por pares]

Moscow: Pleiades Publishing

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9
3D Microfabrication Using Emulsion Mask Grayscale Photolithography Technique
3D Microfabrication Using Emulsion Mask Grayscale Photolithography Technique
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3D Microfabrication Using Emulsion Mask Grayscale Photolithography Technique

Lee, Tze Pin ; Mohamed, Khairudin

IOP conference series. Materials Science and Engineering, 2016-02, Vol.114 (1), p.12032-12039 [Periódico revisado por pares]

Bristol: IOP Publishing

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10
3D Volumetric Energy Deposition of Focused Helium Ion Beam Lithography: Visualization, Modeling, and Applications in Nanofabrication
3D Volumetric Energy Deposition of Focused Helium Ion Beam Lithography: Visualization, Modeling, and Applications in Nanofabrication
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3D Volumetric Energy Deposition of Focused Helium Ion Beam Lithography: Visualization, Modeling, and Applications in Nanofabrication

Cai, Jingxuan ; Zhu, Zhouyang ; Alkemade, Paul F. A. ; van Veldhoven, Emile ; Wang, Qianjin ; Ge, Haixiong ; Rodrigues, Sean P. ; Cai, Wenshan ; Li, Wen‐Di

Advanced materials interfaces, 2018-06, Vol.5 (12), p.n/a [Periódico revisado por pares]

Weinheim: Wiley Subscription Services, Inc

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