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Room temperature visible photoluminescence of silicon nanocrystallites embedded in amorphous silicon carbide matrix
Room temperature visible photoluminescence of silicon nanocrystallites embedded in amorphous silicon carbide matrix
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Room temperature visible photoluminescence of silicon nanocrystallites embedded in amorphous silicon carbide matrix

Coscia, U ; Ambrosone, G ; Basa, D K

Journal of applied physics, 2008-03, Vol.103 (6), p.063507-063507-6 [Periódico revisado por pares]

United States: American Institute of Physics

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2
In-situ spectroscopic ellipsometry and structural study of HfO{sub 2} thin films deposited by radio frequency magnetron sputtering
In-situ spectroscopic ellipsometry and structural study of HfO{sub 2} thin films deposited by radio frequency magnetron sputtering
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In-situ spectroscopic ellipsometry and structural study of HfO{sub 2} thin films deposited by radio frequency magnetron sputtering

Cantas, Ayten ; Aygun, Gulnur ; Basa, Deepak Kumar

Journal of applied physics, 2014-08, Vol.116 (8) [Periódico revisado por pares]

United States

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3
In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputtering
In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputtering
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In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputtering

Cantas, Ayten ; Aygun, Gulnur ; Basa, Deepak Kumar

Journal of applied physics, 2014-08, Vol.116 (8) [Periódico revisado por pares]

Melville: American Institute of Physics

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4
Study on the microstructural and overall disorder in hydrogenated amorphous silicon carbon films
Study on the microstructural and overall disorder in hydrogenated amorphous silicon carbon films
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Study on the microstructural and overall disorder in hydrogenated amorphous silicon carbon films

Ambrosone, G ; Basa, D K ; Coscia, U ; Fathallah, M

Journal of applied physics, 2008-12, Vol.104 (12), p.123520-123520-4 [Periódico revisado por pares]

American Institute of Physics

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5
Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition
Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition
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Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition

Basa, D K ; Abbate, G ; Ambrosone, G ; Coscia, U ; Marino, A

Journal of applied physics, 2010-01, Vol.107 (2), p.023502-023502-6 [Periódico revisado por pares]

United States: American Institute of Physics

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6
Nanocrystal characterization by ellipsometry in porous silicon using model dielectric function
Nanocrystal characterization by ellipsometry in porous silicon using model dielectric function
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Nanocrystal characterization by ellipsometry in porous silicon using model dielectric function

Petrik, Peter ; Fried, Miklos ; Vazsonyi, Eva ; Basa, Peter ; Lohner, Tivadar ; Kozma, Peter ; Makkai, Zsolt

Journal of applied physics, 2009-01, Vol.105 (2), p.024908-024908-6 [Periódico revisado por pares]

American Institute of Physics

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7
Capacitance–voltage measurements on plasma enhanced chemical vapor deposited silicon nitride films
Capacitance–voltage measurements on plasma enhanced chemical vapor deposited silicon nitride films
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Capacitance–voltage measurements on plasma enhanced chemical vapor deposited silicon nitride films

Basa, D. K. ; Bose, M. ; Bose, D. N.

Journal of applied physics, 2000-05, Vol.87 (9), p.4324-4326 [Periódico revisado por pares]

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8
Optical constants of an a-Si1-xCx:H film
Optical constants of an a-Si1-xCx:H film
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Optical constants of an a-Si1-xCx:H film

MUI, K ; BASA, D. K ; SMITH, F. W

Journal of applied physics, 1986-01, Vol.59 (2), p.582-587 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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9
Colliding pulse mode locking for an antiresonant cavity of a Nd:glass laser
Colliding pulse mode locking for an antiresonant cavity of a Nd:glass laser
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Colliding pulse mode locking for an antiresonant cavity of a Nd:glass laser

BUCHERT, J. M ; BASA, D. K ; TZU, C ; ALFANO, R. R

J. Appl. Phys.; (United States), 1984-02, Vol.55 (3), p.683-684 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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10
Optical constants of an a -Si1− x C x :H film
Optical constants of an a -Si1− x C x :H film
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Optical constants of an a -Si1− x C x :H film

Mui, K. ; Basa, D. K. ; Smith, F. W.

Journal of applied physics, 1986-01, Vol.59 (2), p.582-587 [Periódico revisado por pares]

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