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The influence of substrate temperature and Al mobility on the microstructural evolution of magnetron sputtered ternary Ti-Al-N thin films
The influence of substrate temperature and Al mobility on the microstructural evolution of magnetron sputtered ternary Ti-Al-N thin films
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The influence of substrate temperature and Al mobility on the microstructural evolution of magnetron sputtered ternary Ti-Al-N thin films

Beckers, M ; Höglund, C ; Baehtz, C ; Martins, R M. S ; Persson, P O. Å ; Hultman, L ; Möller, W

Journal of applied physics, 2009-09, Vol.106 (6), p.064915-064915-7 [Periódico revisado por pares]

United States: American Institute of Physics

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Epitaxial V{sub 0.6}W{sub 0.4}N/MgO(001): Evidence for ordering on the cation sublattice
Epitaxial V{sub 0.6}W{sub 0.4}N/MgO(001): Evidence for ordering on the cation sublattice
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Epitaxial V{sub 0.6}W{sub 0.4}N/MgO(001): Evidence for ordering on the cation sublattice

Kindlund, H. ; Lu, J. ; Jensen, J. ; Hultman, L. ; Petrov, I. ; Greene, J. E. ; Department of Materials Science and the Fredrick Seitz Materials Research Laboratory, University of Illinois, 104 South Goodwin, Urbana, Illinois 61801

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-07, Vol.31 (4) [Periódico revisado por pares]

United States

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3
Nucleation and growth of Ti{sub 2}AlN thin films deposited by reactive magnetron sputtering onto MgO(111)
Nucleation and growth of Ti{sub 2}AlN thin films deposited by reactive magnetron sputtering onto MgO(111)
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Nucleation and growth of Ti{sub 2}AlN thin films deposited by reactive magnetron sputtering onto MgO(111)

Beckers, M. ; Schell, N. ; Martins, R. M. S. ; Muecklich, A. ; Moeller, W. ; Hultman, L. ; Thin Film Physics Division, Department of Physics, Chemistry, and Biology

Journal of applied physics, 2007-10, Vol.102 (7) [Periódico revisado por pares]

United States

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4
Topotaxial growth of Ti{sub 2}AlN by solid state reaction in AlN/Ti(0001) multilayer thin films
Topotaxial growth of Ti{sub 2}AlN by solid state reaction in AlN/Ti(0001) multilayer thin films
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Topotaxial growth of Ti{sub 2}AlN by solid state reaction in AlN/Ti(0001) multilayer thin films

Hoeglund, C. ; Beckers, M. ; Schell, N. ; Borany, J. v. ; Birch, J. ; Hultman, L. ; GKSS Research Center Geesthacht, Max-Planck-Str. 1, D-21502 Geesthacht ; Institute of Ion Beam Physics and Materials Research, Forschungszentrum Dresden-Rossendorf, P.O. Box 510119, D-01314 Dresden ; Thin Film Physics Division, Department of Physics, Chemistry and Biology

Applied physics letters, 2007-04, Vol.90 (17) [Periódico revisado por pares]

United States

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5
Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al{sub 2}O{sub 3}-ZrO{sub 2} thin films
Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al{sub 2}O{sub 3}-ZrO{sub 2} thin films
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Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al{sub 2}O{sub 3}-ZrO{sub 2} thin films

Trinh, D.H. ; Hoegberg, H. ; Andersson, J.M. ; Collin, M. ; Reineck, I. ; Helmersson, U. ; Hultman, L. ; Department of Physics, Chemistry and Biology ; Sandvik Tooling, SE-126 80 Stockholm ; Department of Physics, Chemistry, and Biology ; Department of Physics, Chemistry, and Biology

Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, 2006-03, Vol.24 (2)

United States

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