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Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition
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Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition

Abbasi-Firouzjah, M. ; Shokri, B.

Journal of applied physics, 2013-12, Vol.114 (21) [Periódico revisado por pares]

Melville: American Institute of Physics

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2
Physicochemical Properties and Inductive Effect of Calcium Strontium Silicate on the Differentiation of Human Dental Pulp Stem Cells for Vital Pulp Therapies: An In Vitro Study
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Physicochemical Properties and Inductive Effect of Calcium Strontium Silicate on the Differentiation of Human Dental Pulp Stem Cells for Vital Pulp Therapies: An In Vitro Study

Abdalla, Mohamed Mahmoud ; Lung, Christie Y K ; Bijle, Mohammed Nadeem ; Yiu, Cynthia Kar Yung

Materials, 2022-08, Vol.15 (17), p.5854 [Periódico revisado por pares]

Switzerland: MDPI AG

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3
Surface Activation of Poly(Methyl Methacrylate) with Atmospheric Pressure Ar + H2O Plasma
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Surface Activation of Poly(Methyl Methacrylate) with Atmospheric Pressure Ar + H2O Plasma

Abdel–Fattah, Essam

Coatings (Basel), 2019-04, Vol.9 (4), p.228 [Periódico revisado por pares]

Basel: MDPI AG

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4
Distinctive patterns and characteristics of neon jet launched from plasma candle device
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Distinctive patterns and characteristics of neon jet launched from plasma candle device

Abdelaziz, Ayman A. ; Kim, Hyun‐Ha

Plasma processes and polymers, 2021-04, Vol.18 (4), p.n/a [Periódico revisado por pares]

Weinheim: Wiley Subscription Services, Inc

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5
Octreotide-conjugated silver nanoparticles for active targeting of somatostatin receptors and their application in a nebulized rat model
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Octreotide-conjugated silver nanoparticles for active targeting of somatostatin receptors and their application in a nebulized rat model

Abdellatif, Ahmed A. H. ; Khan, Riaz A. ; Alhowail, Ahmad H. ; Alqasoumi, Abdulmajeed ; Sajid, Sultan M. ; Mohammed, Ahmed M. ; Alsharidah, Mansour ; Al Rugaie, Osamah ; Mousa, Ayman M.

Nanotechnology reviews (Berlin), 2022-01, Vol.11 (1), p.266-283 [Periódico revisado por pares]

Berlin: De Gruyter

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6
Investigation of carbon plasma species emission at relatively high KrF laser fluences in nitrogen ambient
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Investigation of carbon plasma species emission at relatively high KrF laser fluences in nitrogen ambient

Abdelli-Messaci, S. ; Kerdja, T. ; Bendib, A. ; Aberkane, S.M. ; Lafane, S. ; Malek, S.

Applied surface science, 2005-12, Vol.252 (5), p.2012-2020 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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7
Investigation of a scalable barrel atmospheric plasma reactor for the treatment of polymer particles
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Investigation of a scalable barrel atmospheric plasma reactor for the treatment of polymer particles

Abourayana, Hisham M. ; Milosavljević, Vladimir ; Dobbyn, Peter ; Cullen, Patrick J. ; Dowling, Denis P.

Surface & coatings technology, 2016-12, Vol.308, p.435-441 [Periódico revisado por pares]

Elsevier B.V

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8
Evaluation of the Effect of Plasma Treatment Frequency on the Activation of Polymer Particles
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Evaluation of the Effect of Plasma Treatment Frequency on the Activation of Polymer Particles

Abourayana, Hisham M. ; Milosavljević, Vladimir ; Dobbyn, Peter ; Dowling, Denis P.

Plasma chemistry and plasma processing, 2017-07, Vol.37 (4), p.1223-1235 [Periódico revisado por pares]

New York: Springer US

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9
Effect of helium mixing on excitation temperature and nitrogen dissociation in inductively coupled plasma
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Effect of helium mixing on excitation temperature and nitrogen dissociation in inductively coupled plasma

Abrar, M. ; Qayyum, A. ; Gilani, A.R. ; Khan, A.W. ; Saeed, A. ; Naseer, S. ; Zakaullah, M.

Current Applied Physics, 2013, 13(6), , pp.969-974 [Periódico revisado por pares]

Elsevier B.V

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10
Process monitoring during AlN deposition by reactive magnetron sputtering
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Process monitoring during AlN deposition by reactive magnetron sputtering

Acosta, J. ; Rojo, A. ; Salas, O. ; Oseguera, J.

Surface & coatings technology, 2007-06, Vol.201 (18), p.7992-7999 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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