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Inorganic–organic hybrid materials for application in optical devices
Inorganic–organic hybrid materials for application in optical devices
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Inorganic–organic hybrid materials for application in optical devices

Houbertz, R. ; Domann, G. ; Cronauer, C. ; Schmitt, A. ; Martin, H. ; Park, J.-U. ; Fröhlich, L. ; Buestrich, R. ; Popall, M. ; Streppel, U. ; Dannberg, P. ; Wächter, C. ; Bräuer, A.

Thin solid films, 2003-10, Vol.442 (1), p.194-200 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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2
Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering
Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering
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Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering

Jäger, S. ; Szyszka, B. ; Szczyrbowski, J. ; Bräuer, G.

Surface & coatings technology, 1998-01, Vol.98 (1), p.1304-1314 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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3
New low emissivity coating based on TwinMag® sputtered TiO2 and Si3N4 layers
New low emissivity coating based on TwinMag® sputtered TiO2 and Si3N4 layers
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New low emissivity coating based on TwinMag® sputtered TiO2 and Si3N4 layers

SZCZYRBOWSKI, J ; BRÄUER, G ; RUSKE, M ; SCHILLING, H ; ZMELTY, A

Thin solid films, 1999-08, Vol.351 (1-2), p.254-259 [Periódico revisado por pares]

Lausanne: Elsevier Science

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4
Mid frequency sputtering — a novel tool for large area coating
Mid frequency sputtering — a novel tool for large area coating
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Mid frequency sputtering — a novel tool for large area coating

Bräuer, G. ; Szczyrbowski, J. ; Teschner, G.

Surface & coatings technology, 1997-10, Vol.94 (1-3), p.658-662 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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5
Properties of SnO2 films prepared by DC and MF reactive sputtering
Properties of SnO2 films prepared by DC and MF reactive sputtering
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Properties of SnO2 films prepared by DC and MF reactive sputtering

RUSKE, M ; BRÄUER, G ; PISTNER, J ; PFÄFFLIN, U ; SZCZYRBOWSKI, J

Thin solid films, 1999-08, Vol.351 (1-2), p.146-150 [Periódico revisado por pares]

Lausanne: Elsevier Science

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6
In situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thickness attainable with ellipsometry and photometry
In situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thickness attainable with ellipsometry and photometry
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In situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thickness attainable with ellipsometry and photometry

Vergöhl, M. ; Malkomes, N. ; Matthée, T. ; Bräuer, G. ; Richter, U. ; Nickol, F.-W. ; Bruch, J.

Thin solid films, 2001-07, Vol.392 (2), p.258-264 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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7
Properties of SiO2 and Si3N4 layers deposited by MF twin magnetron sputtering using different target materials
Properties of SiO2 and Si3N4 layers deposited by MF twin magnetron sputtering using different target materials
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Properties of SiO2 and Si3N4 layers deposited by MF twin magnetron sputtering using different target materials

RUSKE, M ; BRÄUER, G ; PISTNER, J ; SZCZYRBOWSKI, J ; WEIGERT, M

Thin solid films, 1999-08, Vol.351 (1-2), p.158-163 [Periódico revisado por pares]

Lausanne: Elsevier Science

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8
Properties of Si3N4-Layers Deposited by Medium Frequency Twin Magnetron Sputtering
Properties of Si3N4-Layers Deposited by Medium Frequency Twin Magnetron Sputtering
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Properties of Si3N4-Layers Deposited by Medium Frequency Twin Magnetron Sputtering

Ruske, M. ; Bräuer, G. ; Pistner, J. ; Szczyrbowski, J. ; Zmelty, A.

Materials science forum, 1998-01, Vol.287-288, p.247-250 [Periódico revisado por pares]

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