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Refinado por: assunto: Ion Beam Lithography remover
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Ion tracks and microtechnology principles and applications
Ion tracks and microtechnology principles and applications
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Ion tracks and microtechnology principles and applications

Reimar Spohr Klaus Bethge 1931-

Braunschweig Vieweg c1990

Localização: FFCLRP - Fac. Fil. Ciên. Let. de R. Preto    (537.561 S762i e.2 )(Acessar)

2
Papers from the 50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
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Papers from the 50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (50th : 2006 : Baltimore, Md.) Shalom J Wind; American Vacuum Society.; IEEE Electron Devices Society.; Optical Society of America.

Melville, N.Y. : AVS through the American Institute of Physics c2006

Localização: IF - Instituto de Física    (J.Vac.Sci.Technol.A v.24 n.6 )(Acessar)

3
Electron, ion, and photon beam technology and nanofabrication
Electron, ion, and photon beam technology and nanofabrication
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Electron, ion, and photon beam technology and nanofabrication

International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (51st 2007 Denver, CO)

Journal of Vacuum Science & Technology B 2nd ser., v. 25, no.6, 2007

Melville, N.Y. American Institute of Physics 2007

Localização: IF - Instituto de Física    (J.Vac.Sci.Technol. v.25(6)2007 )(Acessar)

4
Methods and Materials in Microelectronic Technology
Methods and Materials in Microelectronic Technology
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Methods and Materials in Microelectronic Technology

Bargon, Joachim

New York, NY: Springer 1984

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5
Methodologies for Detecting Quantal Exocytosis in Adrenal Chromaffin Cells Through Diamond-Based MEAs
Methodologies for Detecting Quantal Exocytosis in Adrenal Chromaffin Cells Through Diamond-Based MEAs
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Methodologies for Detecting Quantal Exocytosis in Adrenal Chromaffin Cells Through Diamond-Based MEAs

Tomagra, Giulia ; Franchino, Claudio ; Carbone, Emilio ; Marcantoni, Andrea ; Pasquarelli, Alberto ; Picollo, Federico ; Carabelli, Valentina

Chromaffin Cells, 2023-01, Vol.2565, p.213-221

New York, NY: Springer US

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6
Lithography and Other Patterning Techniques for Future Electronics
Lithography and Other Patterning Techniques for Future Electronics
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Lithography and Other Patterning Techniques for Future Electronics

Pease, R. Fabian ; Chou, Stephen Y.

Proceedings of the IEEE, 2008-02, Vol.96 (2), p.248-270 [Periódico revisado por pares]

New York: IEEE

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7
High-energy ion (He+, Si++, Ga+, Au++) interactions with PMMA in ion beam lithography
High-energy ion (He+, Si++, Ga+, Au++) interactions with PMMA in ion beam lithography
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High-energy ion (He+, Si++, Ga+, Au++) interactions with PMMA in ion beam lithography

Zhang, Lei ; Thomas, Joseph P ; Guan, Xiaoyi ; Heinig, Nina F ; Leung, Kam Tong

Nanotechnology, 2020-08, Vol.31 (32), p.325301-325301 [Periódico revisado por pares]

England: IOP Publishing

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8
Diamond-based sensors for in vitro cellular radiobiology: Simultaneous detection of cell exocytic activity and ionizing radiation
Diamond-based sensors for in vitro cellular radiobiology: Simultaneous detection of cell exocytic activity and ionizing radiation
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Diamond-based sensors for in vitro cellular radiobiology: Simultaneous detection of cell exocytic activity and ionizing radiation

Tomagra, Giulia ; Peroni, Giulia ; Aprà, Pietro ; Bonino, Valentina ; Campostrini, Matteo ; Carabelli, Valentina ; Collà Ruvolo, Cecilia ; Lo Giudice, Alessandro ; Guidorzi, Laura ; Mino, Lorenzo ; Olivero, Paolo ; Pacher, Luca ; Picariello, Fabio ; Re, Alessandro ; Rigato, Valentino ; Truccato, Marco ; Varzi, Veronica ; Vittone, Ettore ; Picollo, Federico

Biosensors & bioelectronics, 2023-01, Vol.220, p.114876, Article 114876 [Periódico revisado por pares]

Elsevier B.V

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9
The influence of Au‐nanoparticles presence in PDMS on microstructures creation by ion beam lithography
The influence of Au‐nanoparticles presence in PDMS on microstructures creation by ion beam lithography
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The influence of Au‐nanoparticles presence in PDMS on microstructures creation by ion beam lithography

Romanenko, Oleksandr ; Slepička, Petr ; Malinsky, Petr ; Cutroneo, Mariapompea ; Havránek, Vladimír ; Stammers, James ; Švorčík, Václav ; Macková, Anna

Surface and interface analysis, 2020-12, Vol.52 (12), p.1040-1044 [Periódico revisado por pares]

Bognor Regis: Wiley Subscription Services, Inc

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10
Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film
Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film
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Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film

Romanenko, Oleksandr ; Lavrentiev, Vasily ; Borodkin, Andrei ; Havranek, Vladimir ; Mackova, Anna

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2023-05, Vol.538, p.123-130 [Periódico revisado por pares]

Elsevier B.V

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