Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Energy dependence of the sputtering yield of silicon bombarded with neon, argon, krypton, and Xenon ionsZALM, P. CJ. Appl. Phys.; (United States), 1983-05, Vol.54 (5), p.2660-2666 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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2 |
Material Type: Artigo
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Theoretical calculations of energy transfer from noble gases to surfacesLUO, Z ; HOU, QJournal of applied physics, 1993-11, Vol.74 (10), p.6007-6011 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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3 |
Material Type: Artigo
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Slowing down and thermalization of sputtered particle fluxes: energy distributionsGRAS-MARTI, A ; VALLES-ABARCA, J. AJ. Appl. Phys.; (United States), 1983-02, Vol.54 (2), p.1071-1075 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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4 |
Material Type: Artigo
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The dependence of Si and SiO2 electron emission of the angle of ion incidenceJACOBSSON, H ; HOLMEN, GJournal of applied physics, 1993-11, Vol.74 (10), p.6397-6400 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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5 |
Material Type: Artigo
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Modeling of the bremsstrahlung radiation produced in pure-element targets by 10-40 keV electronsSMALL, J. A ; LEIGH, S. D ; NEWBURY, D. E ; MYKLEBUST, R. LJ. Appl. Phys.; (United States), 1987-01, Vol.61 (2), p.459-469 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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6 |
Material Type: Artigo
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Criterion analysis on nonpoisoning of the target surfaceJINGYI WANG ; WEI CHEN ; YU WANG ; NING ZHAO ; XIAOMING HE ; RODIONOV, Y. AJournal of applied physics, 1993-03, Vol.73 (5), p.2518-2523 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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7 |
Material Type: Artigo
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Elastic scattering of low-energy positrons by bound silicon and germaniumANTOLAK, A. J ; WILLIAMSON, W. JRJournal of applied physics, 1991-03, Vol.69 (6), p.3760-3762 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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8 |
Material Type: Artigo
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Sputtering of negative hydrogen ions by cesium bombardmentLOPES, J. L ; GREER, J. A ; SEIDL, MJ. Appl. Phys.; (United States), 1986-07, Vol.60 (1), p.17-23 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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9 |
Material Type: Artigo
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Consequences of sputtering with molecular ionsZALM, P. C ; BECKERS, L. JJ. Appl. Phys.; (United States), 1984-07, Vol.56 (1), p.220-223 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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10 |
Material Type: Artigo
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Electron-hole pair creation at a Ge(100) surface by ground-state neutral Xe atomsAMIRAV, A ; LAMBERT, W. R ; CARDILLO, M. J ; TREVOR, P. L ; LUKE, P. N ; HALLER, E. EJ. Appl. Phys.; (United States), 1986-03, Vol.59 (6), p.2213-2215 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |