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Simulations of magnetic priming in a relativistic magnetron
Simulations of magnetic priming in a relativistic magnetron
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Simulations of magnetic priming in a relativistic magnetron

Jones, M.C. ; Neculaes, V.B. ; White, W.M. ; Lau, Y.Y. ; Gilgenbach, R.M. ; Luginsland, J.W. ; Pengvanich, P. ; Jordan, N.M. ; Hidaka, Y. ; Bosman, H.L.

IEEE transactions on electron devices, 2005-05, Vol.52 (5), p.858-863 [Periódico revisado por pares]

New York, NY: IEEE

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2
Magnetic priming effects on noise, startup, and mode competition in magnetrons
Magnetic priming effects on noise, startup, and mode competition in magnetrons
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Magnetic priming effects on noise, startup, and mode competition in magnetrons

Neculaes, V.B. ; Jones, M.C. ; Gilgenbach, R.M. ; Lau, Y.Y. ; Luginsland, J.W. ; Hoff, B.W. ; White, W.M. ; Jordan, N.M. ; Pengvanich, P. ; Hidaka, Y. ; Bosman, H.L.

IEEE transactions on plasma science, 2005-02, Vol.33 (1), p.94-102 [Periódico revisado por pares]

New York, NY: IEEE

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3
Magnetic perturbation effects on noise and startup in DC-operating oven magnetrons
Magnetic perturbation effects on noise and startup in DC-operating oven magnetrons
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Magnetic perturbation effects on noise and startup in DC-operating oven magnetrons

Neculaes, V.B. ; Jones, M.C. ; Gilgenbach, R.M. ; Lau, Y.Y. ; Luginsland, J.W. ; Hoff, B.W. ; White, W.M. ; Jordan, N.M. ; Pengvanich, P. ; Hidaka, Y. ; Bosman, H.L.

IEEE transactions on electron devices, 2005-05, Vol.52 (5), p.864-871 [Periódico revisado por pares]

New York, NY: IEEE

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4
Rapid kinematic bunching and parametric instability in a crossed-field gap with a periodic magnetic field
Rapid kinematic bunching and parametric instability in a crossed-field gap with a periodic magnetic field
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Rapid kinematic bunching and parametric instability in a crossed-field gap with a periodic magnetic field

Neculaes, V.B. ; Pengvanich, P. ; Hidaka, Y. ; Lau, Y.Y. ; Gilgenbach, R.M. ; White, W.M. ; Jones, M.C. ; Bosman, H.L. ; Luginsland, J.W.

IEEE transactions on plasma science, 2005-04, Vol.33 (2), p.654-660 [Periódico revisado por pares]

New York, NY: IEEE

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