Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Laser-induced chemical etching of silicon in chlorine atmosphere. III: Combined cw and pulsed irradiationKULLMER, R ; BAUERLE, DApplied Physics A: Solids and Surface, 1988-12, Vol.47 (4), p.377-386 [Periódico revisado por pares]Heidelberg: SpringerTexto completo disponível |
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2 |
Material Type: Artigo
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Laser-induced chemical etching of silicon in chlorine atmosphere. I: Pulsed irradiationKULLMER, R ; BAUERLE, DApplied Physics A Solids and Surfaces, 1987-07, Vol.43 (3), p.227-232 [Periódico revisado por pares]Heidelberg: SpringerTexto completo disponível |
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3 |
Material Type: Artigo
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Laser-induced chemical etching of silicon on chlorine atmosphere. II: Continuous irradiationMOGYOROSI, P ; PIGLMAYER, K ; KULLMER, R ; BAUERLE, DApplied Physics A Solids and Surfaces, 1988-04, Vol.45 (4), p.293-299 [Periódico revisado por pares]Heidelberg: SpringerTexto completo disponível |