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Infrared optical responses of wurtzite InxGa1−xN thin films with porous surface morphology
Infrared optical responses of wurtzite InxGa1−xN thin films with porous surface morphology
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Infrared optical responses of wurtzite InxGa1−xN thin films with porous surface morphology

Yew, P ; Lee, S.C ; Ng, S.S ; Hassan, H. Abu ; Chen, W.L ; Osipowicz, T ; Ren, M.Q

Thin Solid Films, 31 March 2016, Vol.603, pp.334-341 [Periódico revisado por pares]

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2
Fabrication of β-AgGaO2 thin films by radio frequency magnetron sputtering
Fabrication of β-AgGaO2 thin films by radio frequency magnetron sputtering
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Fabrication of β-AgGaO2 thin films by radio frequency magnetron sputtering

Suzuki, Issei ; Nagatani, Hiraku ; Arima, Yuta ; Kita, Masao ; Omata, Takahisa

Thin Solid Films, 30 May 2014, Vol.559, pp.112-115 [Periódico revisado por pares]

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3
Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
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Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition

Ozgit, Cagla ; Donmez, Inci ; Alevli, Mustafa ; Biyikli, Necmi

Thin Solid Films, 31 January 2012, Vol.520(7), pp.2750-2755 [Periódico revisado por pares]

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4
Influence of CrN and AlN layer thicknesses on structure and mechanical properties of CrN/AlN superlattices
Influence of CrN and AlN layer thicknesses on structure and mechanical properties of CrN/AlN superlattices
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Influence of CrN and AlN layer thicknesses on structure and mechanical properties of CrN/AlN superlattices

Schlögl, M ; Mayer, B ; Paulitsch, J ; Mayrhofer, P.H

Thin Solid Films, 31 October 2013, Vol.545, pp.375-379 [Periódico revisado por pares]

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5
Calculation of dispersion of surface and interface phonon polariton resonances in wurtzite semiconductor multilayer system taking damping effects into account
Calculation of dispersion of surface and interface phonon polariton resonances in wurtzite semiconductor multilayer system taking damping effects into account
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Calculation of dispersion of surface and interface phonon polariton resonances in wurtzite semiconductor multilayer system taking damping effects into account

Lee, S.C ; Ng, S.S ; Abu Hassan, H ; Hassan, Z ; Dumelow, T

Thin Solid Films, 31 January 2014, Vol.551, pp.114-119 [Periódico revisado por pares]

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6
Studies of surface and interface phonon polariton characteristics of wurtzite ZnO thin film on wurtzite 6H-SiC substrate by p-polarized infrared attenuated total reflection spectroscopy
Studies of surface and interface phonon polariton characteristics of wurtzite ZnO thin film on wurtzite 6H-SiC substrate by p-polarized infrared attenuated total reflection spectroscopy
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Studies of surface and interface phonon polariton characteristics of wurtzite ZnO thin film on wurtzite 6H-SiC substrate by p-polarized infrared attenuated total reflection spectroscopy

Lee, S.C ; Ng, S.S ; Al-Hardan, N.H ; Abdullah, M.J ; Hassan, Z ; Hassan, H. Abu

Thin Solid Films, 2011, Vol.519(11), pp.3703-3708 [Periódico revisado por pares]

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7
Effect of the electrochemical technique on nanocrystalline ZnO electrodeposition, its structural, morphological and photoelectrochemical properties
Effect of the electrochemical technique on nanocrystalline ZnO electrodeposition, its structural, morphological and photoelectrochemical properties
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Effect of the electrochemical technique on nanocrystalline ZnO electrodeposition, its structural, morphological and photoelectrochemical properties

Chettah, Hamdane ; Abdi, Djamila

Thin Solid Films, 30 June 2013, Vol.537, pp.119-123 [Periódico revisado por pares]

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8
Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness
Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness
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Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness

Shimizu, Tetsuhide ; Teranishi, Yoshikazu ; Morikawa, Kazuo ; Komiya, Hidetoshi ; Watanabe, Tomotaro ; Nagasaka, Hiroshi ; Yang, Ming

Thin Solid Films, 30 April 2015, Vol.581, pp.39-47 [Periódico revisado por pares]

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9
Atomic layer deposition of ZnS via in situ production of H 2S
Atomic layer deposition of ZnS via in situ production of H 2S
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Atomic layer deposition of ZnS via in situ production of H 2S

Bakke, J.R ; King, J.S ; Jung, H.J ; Sinclair, R ; Bent, S.F

Thin Solid Films, 2010, Vol.518(19), pp.5400-5408 [Periódico revisado por pares]

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10
Epitaxial growth of Al–Cr–N thin films on MgO(111)
Epitaxial growth of Al–Cr–N thin films on MgO(111)
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Epitaxial growth of Al–Cr–N thin films on MgO(111)

Willmann, H ; Beckers, M ; Birch, J ; Mayrhofer, P.H ; Mitterer, C ; Hultman, L

Thin Solid Films, 2008, Vol.517(2), pp.598-602 [Periódico revisado por pares]

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Deste Autor:

  1. Abu Hassan, H
  2. Lee, S.C
  3. Ng, S.S
  4. Hassan, H. Abu
  5. Hassan, Z.

Neste Assunto:

  1. Engineering
  2. Physics
  3. Wurtzite
  4. Thin Films
  5. Thin Films, Surfaces, and Interfaces (So)

  • Realização: USP

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