Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
---|---|---|---|
1 |
Material Type: Artigo
|
Room temperature visible photoluminescence of silicon nanocrystallites embedded in amorphous silicon carbide matrixCoscia, U ; Ambrosone, G ; Basa, D KJournal of applied physics, 2008-03, Vol.103 (6), p.063507-063507-6 [Periódico revisado por pares]United States: American Institute of PhysicsTexto completo disponível |
|
2 |
Material Type: Artigo
|
In-situ spectroscopic ellipsometry and structural study of HfO{sub 2} thin films deposited by radio frequency magnetron sputteringCantas, Ayten ; Aygun, Gulnur ; Basa, Deepak KumarJournal of applied physics, 2014-08, Vol.116 (8) [Periódico revisado por pares]United StatesTexto completo disponível |
|
3 |
Material Type: Artigo
|
In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputteringCantas, Ayten ; Aygun, Gulnur ; Basa, Deepak KumarJournal of applied physics, 2014-08, Vol.116 (8) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
|
4 |
Material Type: Artigo
|
Study on the microstructural and overall disorder in hydrogenated amorphous silicon carbon filmsAmbrosone, G ; Basa, D K ; Coscia, U ; Fathallah, MJournal of applied physics, 2008-12, Vol.104 (12), p.123520-123520-4 [Periódico revisado por pares]American Institute of PhysicsTexto completo disponível |
|
5 |
Material Type: Artigo
|
Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor depositionBasa, D K ; Abbate, G ; Ambrosone, G ; Coscia, U ; Marino, AJournal of applied physics, 2010-01, Vol.107 (2), p.023502-023502-6 [Periódico revisado por pares]United States: American Institute of PhysicsTexto completo disponível |
|
6 |
Material Type: Artigo
|
Nanocrystal characterization by ellipsometry in porous silicon using model dielectric functionPetrik, Peter ; Fried, Miklos ; Vazsonyi, Eva ; Basa, Peter ; Lohner, Tivadar ; Kozma, Peter ; Makkai, ZsoltJournal of applied physics, 2009-01, Vol.105 (2), p.024908-024908-6 [Periódico revisado por pares]American Institute of PhysicsTexto completo disponível |
|
7 |
Material Type: Artigo
|
Capacitance–voltage measurements on plasma enhanced chemical vapor deposited silicon nitride filmsBasa, D. K. ; Bose, M. ; Bose, D. N.Journal of applied physics, 2000-05, Vol.87 (9), p.4324-4326 [Periódico revisado por pares]Texto completo disponível |
|
8 |
Material Type: Artigo
|
Optical constants of an a-Si1-xCx:H filmMUI, K ; BASA, D. K ; SMITH, F. WJournal of applied physics, 1986-01, Vol.59 (2), p.582-587 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
|
9 |
Material Type: Artigo
|
Colliding pulse mode locking for an antiresonant cavity of a Nd:glass laserBUCHERT, J. M ; BASA, D. K ; TZU, C ; ALFANO, R. RJ. Appl. Phys.; (United States), 1984-02, Vol.55 (3), p.683-684 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
|
10 |
Material Type: Artigo
|
Optical constants of an a-Si(1-x)C(x):H filmMui, K ; Basa, D K ; Smith, F WJournal of applied physics, 1986-01, Vol.59, p.582-587 [Periódico revisado por pares]Texto completo disponível |