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1
Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)
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Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)

Gorelick, S. ; Puttaraksa, N. ; Sajavaara, T. ; Laitinen, M. ; Singkarat, S. ; Whitlow, H.J.

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2008-05, Vol.266 (10), p.2461-2465 [Periódico revisado por pares]

Elsevier B.V

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2
Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions
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Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions

Puttaraksa, Nitipon ; Norarat, Rattanaporn ; Laitinen, Mikko ; Sajavaara, Timo ; Singkarat, Somsorn ; Whitlow, Harry J.

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2012-02, Vol.272, p.162-164 [Periódico revisado por pares]

Elsevier B.V

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3
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
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Artigo
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Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

Puttaraksa, Nitipon ; Unai, Somrit ; Rhodes, Michael W. ; Singkarat, Kanda ; Whitlow, Harry J. ; Singkarat, Somsorn

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2012-02, Vol.272, p.149-152 [Periódico revisado por pares]

Elsevier B.V

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4
Why are hydrogen ions best for MeV ion beam lithography?
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Artigo
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Why are hydrogen ions best for MeV ion beam lithography?

Norarat, Rattanaporn ; Puttaraksa, Nitipon ; Napari, Mari ; Ananda Sagari, A.R. ; Laitinen, Mikko ; Sajavaara, Timo ; Yotprayoonsak, Peerapong ; Pettersson, Mika ; Chienthavorn, Orapin ; Whitlow, Harry J.

Microelectronic engineering, 2013-02, Vol.102, p.22-24 [Periódico revisado por pares]

Elsevier B.V

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5
Direct Writing of Channels for Microfluidics in Silica by MeV Ion Beam Lithography
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Direct Writing of Channels for Microfluidics in Silica by MeV Ion Beam Lithography

Puttaraksa, Nitipon ; Napari, Mari ; Chienthavorn, Orapin ; Norarat, Rattanaporn ; Sajavaara, Timo ; Laitinen, Mikko ; Singkarat, Somsorn ; Whitlow, Harry J.

Advanced materials research, 2011-05, Vol.254, p.132-135 [Periódico revisado por pares]

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6
Development of economic MeV-ion microbeam technology at Chiang Mai University
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Artigo
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Development of economic MeV-ion microbeam technology at Chiang Mai University

Singkarat, S. ; Puttaraksa, N. ; Unai, S. ; Yu, L.D. ; Singkarat, K. ; Pussadee, N. ; Whitlow, H.J. ; Natyanum, S. ; Tippawan, U.

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2017-08, Vol.404, p.58-64 [Periódico revisado por pares]

Elsevier B.V

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7
Programmable proximity aperture lithography with MeV ion beams
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Programmable proximity aperture lithography with MeV ion beams

Puttaraksa, Nitipon ; Gorelick, Sergey ; Sajavaara, Timo ; Laitinen, Mikko ; Singkarat, Somsorn ; Whitlow, Harry J.

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2008-09, Vol.26 (5), p.1732-1739 [Periódico revisado por pares]

American Vacuum Society

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8
Development of a microfluidic design for an automatic lab-on-chip operation
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Development of a microfluidic design for an automatic lab-on-chip operation

Puttaraksa, Nitipon ; Whitlow, Harry J. ; Napari, Mari ; Meriläinen, Leena ; Gilbert, Leona

Microfluidics and nanofluidics, 2016-10, Vol.20 (10), p.1, Article 142 [Periódico revisado por pares]

Berlin/Heidelberg: Springer Berlin Heidelberg

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9
Development of procedures for programmable proximity aperture lithography
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Development of procedures for programmable proximity aperture lithography

Whitlow, H.J. ; Gorelick, S. ; Puttaraksa, N. ; Napari, M. ; Hokkanen, M.J. ; Norarat, R.

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2013-07, Vol.306, p.307-310 [Periódico revisado por pares]

Elsevier B.V

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10
High speed microfluidic prototyping by programmable proximity aperture MeV ion beam lithography
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High speed microfluidic prototyping by programmable proximity aperture MeV ion beam lithography

Puttaraksa, Nitipon ; Napari, Mari ; Meriläinen, Leena ; Whitlow, Harry J. ; Sajavaara, Timo ; Gilbert, Leona

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2013-07, Vol.306, p.302-306 [Periódico revisado por pares]

Elsevier B.V

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