Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
---|---|---|---|
1 |
Material Type: Artigo
|
Transition between capacitive and inductive mode in inductively coupled plasma observed by emission computerized tomographyMiyoshi, Y. ; Petrovic, Z.L. ; Makabe, T.IEEE transactions on plasma science, 2002-02, Vol.30 (1), p.130-131 [Periódico revisado por pares]New York: IEEETexto completo disponível |
|
2 |
Material Type: Artigo
|
The growth process and optical emission spectroscopy of amorphous silicon carbide films from methyltrichlorosilane by rf plasma enchanced CVDKaneko, T ; Miyakawa, N ; Sone, H ; Yamazakia, HSurface & coatings technology, 2001-07, Vol.142-144, p.360-364 [Periódico revisado por pares]Texto completo disponível |
|
3 |
Material Type: Artigo
|
A comparison of nanosecond and femtosecond laser-induced plasma spectroscopy of brass samplesMargetic, V ; Pakulev, A ; Stockhaus, A ; Bolshov, M ; Niemax, K ; Hergenröder, RSpectrochimica acta. Part B: Atomic spectroscopy, 2000-11, Vol.55 (11), p.1771-1785 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
|
4 |
Material Type: Artigo
|
Evaporation of zirconia powders in a thermal radio-frequency plasmaBUCHNER, P ; SCHUBERT, H ; UHLENBUSCH, J ; WEISS, MJournal of thermal spray technology, 2001-12, Vol.10 (4), p.666-672 [Periódico revisado por pares]Heidelberg: SpringerTexto completo disponível |
|
5 |
Material Type: Artigo
|
THE ELEMENTAL COMPOSITION OF BENIN MEMORIAL HEADSWILLETT, F. ; SAYRE, E. V.Archaeometry, 2000-02, Vol.42 (1), p.159-188 [Periódico revisado por pares]Oxford, UK: Blackwell Publishing LtdTexto completo disponível |
|
6 |
Material Type: Artigo
|
In Situ Monitoring of GaN Reactive Ion Etching by Optical Emission SpectroscopyYoshida, Harumasa ; Urushido, Tatsuhiro ; Miyake, Hideto ; Hiramatsu, KazumasaJapanese Journal of Applied Physics, 2001-04, Vol.40 (4A), p.L313-L315 [Periódico revisado por pares]Texto completo disponível |
|
7 |
Material Type: Artigo
|
Measuring heavy metals by quantitative thermal vaporizationLUDWIG, C ; SCHULER, A. J ; WOCHELE, J ; STUCKI, SWater science and technology, 2000-01, Vol.42 (7-8), p.209-216 [Periódico revisado por pares]Oxford: Pergamon PressSem texto completo |
|
8 |
Material Type: Artigo
|
High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor DepositionGuo, Lihui ; Kondo, Michio ; Fukawa, Makoto ; Saitoh, Kimihiko ; Matsuda, AkihisaJapanese Journal of Applied Physics, 1998-10, Vol.37 (Part 2, No. 10A), p.L1116-L1118 [Periódico revisado por pares]Texto completo disponível |
|
9 |
Material Type: Artigo
|
Role of powering geometries and sheath gas composition on operation characteristics and the optical emission in the liquid sampling-atmospheric pressure glow dischargeDavis, W.Clay ; Marcus, R.KennethSpectrochimica acta. Part B: Atomic spectroscopy, 2002-09, Vol.57 (9), p.1473-1486 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
|
10 |
Material Type: Artigo
|
Use of optical emission spectroscopy for determining the number concentration of chlorine atoms in a chlorine-oxygen plasmaSkorodumov, A. E. ; Sitanov, D. V. ; Svettsov, V. I.High energy chemistry, 2000-09, Vol.34 (5), p.331-333 [Periódico revisado por pares]New York: Springer Nature B.VTexto completo disponível |