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Thermal stability of diamondlike carbon films
Thermal stability of diamondlike carbon films
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Thermal stability of diamondlike carbon films

Akkerman, Z. L. ; Efstathiadis, H. ; Smith, F. W.

Journal of applied physics, 1996-09, Vol.80 (5), p.3068-3075 [Periódico revisado por pares]

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2
The shapes of first-stage sinters
The shapes of first-stage sinters
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The shapes of first-stage sinters

AMAR, F ; BERNHOLC, J ; STEPHEN BERRY, R ; JELLINEK, J ; SALAMON, P

J. Appl. Phys.; (United States), 1989-04, Vol.65 (8), p.3219-3225 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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3
Study on the microstructural and overall disorder in hydrogenated amorphous silicon carbon films
Study on the microstructural and overall disorder in hydrogenated amorphous silicon carbon films
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Study on the microstructural and overall disorder in hydrogenated amorphous silicon carbon films

Ambrosone, G ; Basa, D K ; Coscia, U ; Fathallah, M

Journal of applied physics, 2008-12, Vol.104 (12), p.123520-123520-4 [Periódico revisado por pares]

American Institute of Physics

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4
Characterization of hydrogenated amorphous germanium compounds obtained by x-ray chemical vapor deposition of germane: Effect of the irradiation dose on optical parameters and structural order
Characterization of hydrogenated amorphous germanium compounds obtained by x-ray chemical vapor deposition of germane: Effect of the irradiation dose on optical parameters and structural order
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Characterization of hydrogenated amorphous germanium compounds obtained by x-ray chemical vapor deposition of germane: Effect of the irradiation dose on optical parameters and structural order

Arrais, Aldo ; Benzi, Paola ; Bottizzo, Elena ; Demaria, Chiara

Journal of applied physics, 2007-11, Vol.102 (10), p.104905-104905-6 [Periódico revisado por pares]

United States: American Institute of Physics

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5
Structural analysis of silicon carbon nitride films prepared by vapor transport-chemical vapor deposition
Structural analysis of silicon carbon nitride films prepared by vapor transport-chemical vapor deposition
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Structural analysis of silicon carbon nitride films prepared by vapor transport-chemical vapor deposition

Awad, Y ; El Khakani, M A ; Scarlete, M ; Aktik, C ; Smirani, R ; Camiré, N ; Lessard, M ; Mouine, J

Journal of applied physics, 2010-02, Vol.107 (3), p.033517-033517-6 [Periódico revisado por pares]

American Institute of Physics

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6
X-ray irradiation-induced ionization of CdS 1 − x Se x nanocrystals embedded in borosilicate glass
X-ray irradiation-induced ionization of CdS 1 − x Se x nanocrystals embedded in borosilicate glass
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X-ray irradiation-induced ionization of CdS 1 − x Se x nanocrystals embedded in borosilicate glass

Azhniuk, Yu M ; Prymak, M V ; Lopushansky, V V ; Solomon, A M ; Hutych, Yu I ; Gomonnai, A V ; Zahn, D R. T

Journal of applied physics, 2010-06, Vol.107 (11), p.113528-113528-8 [Periódico revisado por pares]

American Institute of Physics

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7
Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition
Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition
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Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition

Basa, D K ; Abbate, G ; Ambrosone, G ; Coscia, U ; Marino, A

Journal of applied physics, 2010-01, Vol.107 (2), p.023502-023502-6 [Periódico revisado por pares]

United States: American Institute of Physics

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8
Capacitance–voltage measurements on plasma enhanced chemical vapor deposited silicon nitride films
Capacitance–voltage measurements on plasma enhanced chemical vapor deposited silicon nitride films
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Capacitance–voltage measurements on plasma enhanced chemical vapor deposited silicon nitride films

Basa, D. K. ; Bose, M. ; Bose, D. N.

Journal of applied physics, 2000-05, Vol.87 (9), p.4324-4326 [Periódico revisado por pares]

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9
Colliding pulse mode locking for an antiresonant cavity of a Nd:glass laser
Colliding pulse mode locking for an antiresonant cavity of a Nd:glass laser
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Colliding pulse mode locking for an antiresonant cavity of a Nd:glass laser

BUCHERT, J. M ; BASA, D. K ; TZU, C ; ALFANO, R. R

J. Appl. Phys.; (United States), 1984-02, Vol.55 (3), p.683-684 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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10
In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputtering
In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputtering
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In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputtering

Cantas, Ayten ; Aygun, Gulnur ; Basa, Deepak Kumar

Journal of applied physics, 2014-08, Vol.116 (8) [Periódico revisado por pares]

Melville: American Institute of Physics

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