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Refinado por: Nome da Publicação: J. Appl. Phys.; remover assunto: Thin Films remover Journal Of Applied Physics remover
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1
The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon
The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon
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The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon

BROADBENT, E. K ; MORGAN, A. E ; FLANNER, J. M ; COULMAN, B ; SADANA, D. K ; BURROW, B. J ; ELLWANGER, R. C

Journal of applied physics, 1988-12, Vol.64 (12), p.6721-6726 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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2
Thermal stability of thin-film amorphous W-Ru, W-Re, and Ta-Ir alloys
Thermal stability of thin-film amorphous W-Ru, W-Re, and Ta-Ir alloys
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Thermal stability of thin-film amorphous W-Ru, W-Re, and Ta-Ir alloys

DENIER VAN DER GON, A. W ; BARBOUR, J. C ; DE REUS, R ; SARIS, F. W

Journal of applied physics, 1987-02, Vol.61 (3), p.1212-1215 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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3
Composition and deposition temperature dependence of the structure of oxidized thin-film amorphous Tb-Fe
Composition and deposition temperature dependence of the structure of oxidized thin-film amorphous Tb-Fe
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Composition and deposition temperature dependence of the structure of oxidized thin-film amorphous Tb-Fe

HELLMAN, F ; NAKAHARA, S ; FRANKENTHAL, R. P ; VAN DOVER, R. B ; SICONOLFI, D. J ; GYORGY, E. M

Journal of applied physics, 1989-04, Vol.65 (7), p.2847-2851 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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4
Phase separations of amorphous CoW films during oxidation and reactions with Si and Al
Phase separations of amorphous CoW films during oxidation and reactions with Si and Al
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Phase separations of amorphous CoW films during oxidation and reactions with Si and Al

WANG, S. Q ; MAYER, J. W

Journal of applied physics, 1989-03, Vol.65 (5), p.1957-1967 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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5
Interfacial interactions of evaporated iridium thin films with (100) GaAs
Interfacial interactions of evaporated iridium thin films with (100) GaAs
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Interfacial interactions of evaporated iridium thin films with (100) GaAs

KIN MAN YU ; SANDS, T ; JAKLEVIC, J. M ; HALLER, E. E

Journal of applied physics, 1987-09, Vol.62 (5), p.1815-1820 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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6
Au/Ti resistors used for Nb/Pb-alloy Josephson junctions. I: Electrical stability
Au/Ti resistors used for Nb/Pb-alloy Josephson junctions. I: Electrical stability
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Au/Ti resistors used for Nb/Pb-alloy Josephson junctions. I: Electrical stability

MURAKAMI, M ; ALESSANDRINI, E. I ; KIM, K. K

Journal of applied physics, 1984-10, Vol.56 (7), p.2068-2075 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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7
Domain structure and microstructure of CoNi oblique incidence thin films
Domain structure and microstructure of CoNi oblique incidence thin films
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Domain structure and microstructure of CoNi oblique incidence thin films

HUEI-MIN HO ; GAU, G. J.-S ; THOMAS, G

Journal of applied physics, 1989-04, Vol.65 (8), p.3161-3166 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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8
Microstructural studies of epitaxial Ge films grown on [100] GaAs by laser photochemical vapor deposition
Microstructural studies of epitaxial Ge films grown on [100] GaAs by laser photochemical vapor deposition
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Microstructural studies of epitaxial Ge films grown on [100] GaAs by laser photochemical vapor deposition

KIELY, C. J ; TAVITIAN, V ; EDEN, J. G

Journal of applied physics, 1989-05, Vol.65 (10), p.3883-3895 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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9
Characterization of yttria-stabilized zirconium oxide buffer layers for high-temperature superconductor thin films
Characterization of yttria-stabilized zirconium oxide buffer layers for high-temperature superconductor thin films
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Characterization of yttria-stabilized zirconium oxide buffer layers for high-temperature superconductor thin films

LEE, J.-W ; SCHLESINGER, T. E ; STAMPER, A. K ; MIGLIUOLO, M ; GREVE, D. W ; LAUGHLIN, E

Journal of applied physics, 1988-12, Vol.64 (11), p.6502-6504 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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10
Stability of metallic CsCl-structured alloys under ion irradiation
Stability of metallic CsCl-structured alloys under ion irradiation
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Stability of metallic CsCl-structured alloys under ion irradiation

NASTASI, M ; LILIENFELD, D ; JOHNSON, H. H ; MAYER, J. W

Journal of applied physics, 1986-06, Vol.59 (12), p.4011-4016 [Periódico revisado por pares]

Woodbury, NY: American Institute of Physics

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