Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Atmospheric plasmas for thin film deposition: A critical reviewMerche, Delphine ; Vandencasteele, Nicolas ; Reniers, FrançoisThin solid films, 2012-04, Vol.520 (13), p.4219-4236 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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2 |
Material Type: Artigo
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Cold atmospheric plasma: Sources, processes, and applicationsBARDOS, L ; BARANKOVA, HThin solid films, 2010-09, Vol.518 (23), p.6705-6713 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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3 |
Material Type: Artigo
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Cu2ZnSnS4-type thin film solar cells using abundant materialsJIMBO, Kazuo ; KIMURA, Ryoichi ; KAMIMURA, Tsuyoshi ; YAMADA, Satoru ; MAW, Win Shwe ; ARAKI, Hideaki ; OISHI, Koichiro ; KATAGIRI, HironoriThin solid films, 2007-05, Vol.515 (15), p.5997-5999 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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4 |
Material Type: Artigo
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Hollow-cathode chemical vapor deposition of thick, low-stress diamond-like carbon filmsMiller, J. ; Ceballos, A. ; Bayu Aji, L.B. ; Moore, A. ; Wasz, C. ; Kucheyev, S.O. ; Elhadj, S. ; Falabella, S.Thin solid films, 2020-11, Vol.714 (na), p.138394, Article 138394 [Periódico revisado por pares]United States: Elsevier B.VTexto completo disponível |
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5 |
Material Type: Artigo
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Transparent p-type conducting K-doped NiO films deposited by pulsed plasma depositionYang, Ming ; Pu, Haifeng ; Zhou, Qianfei ; Zhang, QunThin solid films, 2012-07, Vol.520 (18), p.5884-5888 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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6 |
Material Type: Artigo
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Synthesis process of gold nanoparticles in solution plasmaSaito, Nagahiro ; Hieda, Junko ; Takai, OsamuThin solid films, 2009-12, Vol.518 (3), p.912-917 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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7 |
Material Type: Artigo
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Micro and nano-structuration of silicon by femtosecond laser: Application to silicon photovoltaic cells fabricationHalbwax, M. ; Sarnet, T. ; Delaporte, Ph ; Sentis, M. ; Etienne, H. ; Torregrosa, F. ; Vervisch, V. ; Perichaud, I. ; Martinuzzi, S.Thin solid films, 2008-08, Vol.516 (20), p.6791-6795 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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8 |
Material Type: Artigo
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Thin film characterization of zinc tin oxide deposited by thermal atomic layer depositionMullings, Marja N. ; Hägglund, Carl ; Tanskanen, Jukka T. ; Yee, Yesheng ; Geyer, Scott ; Bent, Stacey F.Thin Solid Films, 2014-04, Vol.556, p.186-194 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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9 |
Material Type: Artigo
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Large area coating of graphene at low temperature using a roll-to-roll microwave plasma chemical vapor depositionYamada, Takatoshi ; Ishihara, Masatou ; Hasegawa, MasatakaThin solid films, 2013-04, Vol.532, p.89-93 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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10 |
Material Type: Artigo
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Characteristics and applications of plasma enhanced-atomic layer depositionKim, HyungjunThin solid films, 2011-08, Vol.519 (20), p.6639-6644 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |