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Effect of deposition temperature on chemical composition and electronic properties of amorphous carbon nitride ( a-CNx) thin films grown by plasma assisted pulsed laser deposition
Effect of deposition temperature on chemical composition and electronic properties of amorphous carbon nitride ( a-CNx) thin films grown by plasma assisted pulsed laser deposition
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Effect of deposition temperature on chemical composition and electronic properties of amorphous carbon nitride ( a-CNx) thin films grown by plasma assisted pulsed laser deposition

Cappelli, E. ; Trucchi, D.M. ; Kaciulis, S. ; Orlando, S. ; Zanza, A. ; Mezzi, A.

Thin solid films, 2011-04, Vol.519 (12), p.4059-4063 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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2
Effect of radio frequency power and total mass-flow rate on the properties of microcrystalline silicon films prepared by helium-diluted-silane glow discharge
Effect of radio frequency power and total mass-flow rate on the properties of microcrystalline silicon films prepared by helium-diluted-silane glow discharge
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Effect of radio frequency power and total mass-flow rate on the properties of microcrystalline silicon films prepared by helium-diluted-silane glow discharge

Torres, I. ; Barrio, R. ; Santos, J.D. ; González, N. ; Gandía, J.J.

Thin solid films, 2010-09, Vol.518 (23), p.7019-7023 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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3
A finite element model to predict the ablation depth in pulsed laser ablation
A finite element model to predict the ablation depth in pulsed laser ablation
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A finite element model to predict the ablation depth in pulsed laser ablation

Vasantgadkar, Nikhil A. ; Bhandarkar, Upendra V. ; Joshi, Suhas S.

Thin solid films, 2010-12, Vol.519 (4), p.1421-1430 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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4
Optical characterization of HfO2 thin films grown by atomic layer deposition
Optical characterization of HfO2 thin films grown by atomic layer deposition
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Optical characterization of HfO2 thin films grown by atomic layer deposition

AARIK, Jaan ; MÄNDAR, Hugo ; KIRM, Marco ; PUNG, Lembit

Thin solid films, 2004-11, Vol.466 (1-2), p.41-47 [Periódico revisado por pares]

Lausanne: Elsevier Science

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5
Plasma sprayed metal-supported solid oxide fuel cell and stack with nanostructured anodes and diffusion barrier layer
Plasma sprayed metal-supported solid oxide fuel cell and stack with nanostructured anodes and diffusion barrier layer
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Plasma sprayed metal-supported solid oxide fuel cell and stack with nanostructured anodes and diffusion barrier layer

Hwang, Chang-sing ; Tsai, Chun-Huang ; Chang, Chun-Liang ; Chuang, Chih-Ming ; Shie, Zong-Yang Chuang ; Cheng, Shih-Wei ; Wu, Szu-Han

Thin solid films, 2014-11, Vol.570, p.183-188 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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6
The effect of carbon supports on the performance of platinum/carbon nanotubes for proton exchange membrane fuel cells
The effect of carbon supports on the performance of platinum/carbon nanotubes for proton exchange membrane fuel cells
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The effect of carbon supports on the performance of platinum/carbon nanotubes for proton exchange membrane fuel cells

Chiang, Yu-Chun ; Hsieh, Min-Kuei ; Hsu, He-Hong

Thin solid films, 2014-11, Vol.570, p.221-229 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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7
Cr2O3 thin films grown at room temperature by low pressure laser chemical vapour deposition
Cr2O3 thin films grown at room temperature by low pressure laser chemical vapour deposition
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Cr2O3 thin films grown at room temperature by low pressure laser chemical vapour deposition

Sousa, P.M. ; Silvestre, A.J. ; Conde, O.

Thin solid films, 2011-03, Vol.519 (11), p.3653-3657 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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8
Investigation of the tribological behavior and its relationship to the microstructure and mechanical properties of a-SiC: H films elaborated by low frequency plasma assisted chemical vapor deposition
Investigation of the tribological behavior and its relationship to the microstructure and mechanical properties of a-SiC: H films elaborated by low frequency plasma assisted chemical vapor deposition
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Investigation of the tribological behavior and its relationship to the microstructure and mechanical properties of a-SiC: H films elaborated by low frequency plasma assisted chemical vapor deposition

Soum-Glaude, A. ; Rambaud, G. ; Grillo, S.E. ; Thomas, L.

Thin solid films, 2010-12, Vol.519 (4), p.1266-1271 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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9
Substrate melting during thermal spray splat quenching
Substrate melting during thermal spray splat quenching
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Substrate melting during thermal spray splat quenching

Li, L. ; Wang, X.Y. ; Wei, G. ; Vaidya, A. ; Zhang, H. ; Sampath, S.

Thin solid films, 2004-12, Vol.468 (1), p.113-119 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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10
Properties of SiO2-like barrier layers on polyethersulfone substrates by low-temperature plasma-enhanced chemical vapor deposition
Properties of SiO2-like barrier layers on polyethersulfone substrates by low-temperature plasma-enhanced chemical vapor deposition
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Properties of SiO2-like barrier layers on polyethersulfone substrates by low-temperature plasma-enhanced chemical vapor deposition

WUU, D. S ; LO, W. C ; CHANG, L. S ; HORNG, R. H

Thin solid films, 2004-12, Vol.468 (1-2), p.105-108 [Periódico revisado por pares]

Lausanne: Elsevier Science

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