Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Physical properties of epitaxial ZrN/MgO(001) layers grown by reactive magnetron sputteringMei, A. B. ; Howe, B. M. ; Zhang, C. ; Sardela, M. ; Eckstein, J. N. ; Hultman, L. ; Rockett, A. ; Petrov, I. ; Greene, J. E.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-11, Vol.31 (6), p.061516 [Periódico revisado por pares]United StatesTexto completo disponível |
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2 |
Material Type: Artigo
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Sputter deposition from a Ti2AlC target: Process characterization and conditions for growth of Ti2AlCFRODELIUS, J ; EKLUND, P ; BECKERS, M ; PERSSON, P. O. A ; HÖGBERG, H ; HULTMAN, LThin solid films, 2010, Vol.518 (6), p.1621-1626 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
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3 |
Material Type: Artigo
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Phase transformation in κ- and γ-Al2O3 coatings on cutting tool insertsTrinh, D.H. ; Back, K. ; Pozina, G. ; Blomqvist, H. ; Selinder, T. ; Collin, M. ; Reineck, I. ; Hultman, L. ; Högberg, H.Surface & coatings technology, 2009-03, Vol.203 (12), p.1682-1688 [Periódico revisado por pares]Texto completo disponível |
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4 |
Material Type: Artigo
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Direct current magnetron sputtering deposition of nanocomposite alumina — zirconia thin filmsTrinh, D.H. ; Kubart, T. ; Nyberg, T. ; Ottosson, M. ; Hultman, L. ; Högberg, H.Thin solid films, 2008-10, Vol.516 (23), p.8352-8358 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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5 |
Material Type: Artigo
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Microstructure and electrical properties of Ti–Si–C–Ag nanocomposite thin filmsEklund, P. ; Joelsson, T. ; Ljungcrantz, H. ; Wilhelmsson, O. ; Czigány, Zs ; Högberg, H. ; Hultman, L.Surface & coatings technology, 2007, Vol.201 (14), p.6465-6469 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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6 |
Material Type: Artigo
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Ti2AlC coatings deposited by High Velocity Oxy-Fuel sprayingFRODELIUS, Jenny ; SONESTEDT, Marie ; BJÖRKLUND, Stefan ; PALMQUIST, Jens-Petter ; STILLER, Krystyna ; HÖGBERG, Hans ; HULTMAN, LarsSurface & coatings technology, 2008-08, Vol.202 (24), p.5976-5981 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
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7 |
Material Type: Artigo
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Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayersChun, J.-S. ; Carlsson, J. R. A. ; Desjardins, P. ; Bergstrom, D. B. ; Petrov, I. ; Greene, J. E. ; Lavoie, C. ; Cabral, C. ; Hultman, L.J. Vac. Sci. Technol. A, 2001-01, Vol.19 (1), p.182-191 [Periódico revisado por pares]United StatesTexto completo disponível |
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8 |
Material Type: Artigo
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Carbide and nanocomposite thin films in the Ti–Pt–C systemLewin, Erik ; Buchholt, Kristina ; Lu, Jun ; Hultman, Lars ; Spetz, Anita Lloyd ; Jansson, UlfThin solid films, 2010-07, Vol.518 (18), p.5104-5109 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |