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Optimization of KOH etching process to obtain textured substrates suitable for heterojunction solar cells fabricated by HWCVD
Optimization of KOH etching process to obtain textured substrates suitable for heterojunction solar cells fabricated by HWCVD
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Optimization of KOH etching process to obtain textured substrates suitable for heterojunction solar cells fabricated by HWCVD

Muñoz, D. ; Carreras, P. ; Escarré, J. ; Ibarz, D. ; Martín de Nicolás, S. ; Voz, C. ; Asensi, J.M. ; Bertomeu, J.

Thin solid films, 2009-04, Vol.517 (12), p.3578-3580 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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2
Amorphous silicon thin film solar cells deposited entirely by hot-wire chemical vapour deposition at low temperature (< 150 °C)
Amorphous silicon thin film solar cells deposited entirely by hot-wire chemical vapour deposition at low temperature (< 150 °C)
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Amorphous silicon thin film solar cells deposited entirely by hot-wire chemical vapour deposition at low temperature (< 150 °C)

Villar, Fernando ; Antony, Aldrin ; Escarré, Jordi ; Ibarz, Daniel ; Roldán, Rubén ; Stella, Marco ; Muñoz, Delfina ; Asensi, José Miguel ; Bertomeu, Joan

Thin solid films, 2009-04, Vol.517 (12), p.3575-3577 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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3
Effect of buffer layer on minority carrier lifetime and series resistance of bifacial heterojunction silicon solar cells analyzed by impedance spectroscopy
Effect of buffer layer on minority carrier lifetime and series resistance of bifacial heterojunction silicon solar cells analyzed by impedance spectroscopy
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Effect of buffer layer on minority carrier lifetime and series resistance of bifacial heterojunction silicon solar cells analyzed by impedance spectroscopy

Garcia-Belmonte, Germà ; García-Cañadas, Jorge ; Mora-Seró, Ivan ; Bisquert, Juan ; Voz, Cristóbal ; Puigdollers, Joaquim ; Alcubilla, Ramon

Thin solid films, 2006-08, Vol.514 (1), p.254-257 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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4
Hot wire configuration for depositing device grade nano-crystalline silicon at high deposition rate
Hot wire configuration for depositing device grade nano-crystalline silicon at high deposition rate
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Hot wire configuration for depositing device grade nano-crystalline silicon at high deposition rate

Nos, O. ; Frigeri, P.A. ; Bertomeu, J.

Thin solid films, 2011-05, Vol.519 (14), p.4531-4534 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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5
Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate
Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate
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Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate

Fonrodona, M. ; Soler, D. ; Escarré, J. ; Villar, F. ; Bertomeu, J. ; Andreu, J. ; Saboundji, A. ; Coulon, N. ; Mohammed-Brahim, T.

Thin solid films, 2006-04, Vol.501 (1), p.303-306 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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6
Hot wire chemical vapor deposition: limits and opportunities of protecting the tungsten catalyzer from silicide with a cavity
Hot wire chemical vapor deposition: limits and opportunities of protecting the tungsten catalyzer from silicide with a cavity
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Hot wire chemical vapor deposition: limits and opportunities of protecting the tungsten catalyzer from silicide with a cavity

Frigeri, P.A. ; Nos, O. ; Bengoechea, S. ; Frevert, C. ; Asensi, J.M. ; Bertomeu, J.

Thin solid films, 2009-04, Vol.517 (12), p.3427-3430 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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7
Low temperature back-surface-field contacts deposited by hot-wire CVD for heterojunction solar cells
Low temperature back-surface-field contacts deposited by hot-wire CVD for heterojunction solar cells
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Low temperature back-surface-field contacts deposited by hot-wire CVD for heterojunction solar cells

Muñoz, D. ; Voz, C. ; Martin, I. ; Orpella, A. ; Alcubilla, R. ; Villar, F. ; Bertomeu, J. ; Andreu, J. ; Roca-i-Cabarrocas, P.

Thin solid films, 2008-08, Vol.516 (20), p.6782-6785 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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8
Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD
Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD
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Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD

Fonrodona, M. ; Soler, D. ; Villar, F. ; Escarré, J. ; Asensi, J.M. ; Bertomeu, J. ; Andreu, J.

Thin solid films, 2006-04, Vol.501 (1), p.247-251 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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9
Progress in a-Si:H/c-Si heterojunction emitters obtained by Hot-Wire CVD at 200&#160;&#176;C
Progress in a-Si:H/c-Si heterojunction emitters obtained by Hot-Wire CVD at 200&#160;&#176;C
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Progress in a-Si:H/c-Si heterojunction emitters obtained by Hot-Wire CVD at 200 °C

Muñoz, D. ; Voz, C. ; Martin, I. ; Orpella, A. ; Puigdollers, J. ; Alcubilla, R. ; Villar, F. ; Bertomeu, J. ; Andreu, J. ; Damon-Lacoste, J. ; Roca i Cabarrocas, P.

Thin solid films, 2008, Vol.516 (5), p.761-764 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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10
Shutterless deposition of phosphorous doped microcrystalline silicon by Cat-CVD
Shutterless deposition of phosphorous doped microcrystalline silicon by Cat-CVD
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Shutterless deposition of phosphorous doped microcrystalline silicon by Cat-CVD

Fonrodona, M. ; Gordijn, A. ; van Veen, M.K. ; van der Werf, C.H.M. ; Bertomeu, J. ; Andreu, J. ; Schropp, R.E.I.

Thin solid films, 2003-04, Vol.430 (1), p.145-148 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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