Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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[0 0 1] zone-axis bright-field diffraction contrast from coherent Ge(Si) islands on Si(0 0 1)Liao, X.Z ; Zou, J ; Cockayne, D.J.H ; Matsumura, SUltramicroscopy, 2004, Vol.98 (2), p.239-247 [Periódico revisado por pares]Netherlands: Elsevier B.VTexto completo disponível |
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2 |
Material Type: Ata de Congresso
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0-3 nanocomposites for optoelectronics and nonlinear opticsYao, Xi ; Zhang, Liangying ; Liu, ChunliangSPIE 1994Texto completo disponível |
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3 |
Material Type: Ata de Congresso
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0.07 um InP HEMT MMIC Technology for G-band Power AmplifiersLai, R. ; Huang, P. ; Grundbacher, R. ; Farkas, D. ; Cavus, A. ; Liu, P.H. ; Chin, P. ; Chou, Y.C. ; Barsky, M. ; Tsai, R. ; Raja, R. ; Oki, A.2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings, 2006, p.39-41IEEETexto completo disponível |
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4 |
Material Type: Ata de Congresso
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0.1 μm InGaAs/InAlAs/InP HEMT MMICs: a flight qualified technologyCHOU, Y. C ; LEUNG, D ; LAI, R ; GRUNDBACHER, R ; BARSKY, M ; KAN, Q ; TSAI, RTechnical digest - IEEE Gallium Arsenide Integrated Circuit Symposium, 2002, p.77-80Piscataway NJ: IEEETexto completo disponível |
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5 |
Material Type: Artigo
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0.10 μm graded InGaAs channel InP HEMT with 305 GHz fT and 340 GHz fmaxWojtowicz, M. ; Lai, R. ; Streit, D.C. ; Ng, G.I. ; Block, T.R. ; Tan, K.L. ; Liu, P.H. ; Freudenthal, A.K. ; Dia, R.M.IEEE electron device letters, 1994-11, Vol.15 (11), p.477-479 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
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6 |
Material Type: Artigo
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0.15-μm n-n gate CMOS technology with channel selective epitaxy and transient enhanced diffusion suppressionAbiko, Hitoshi ; Ono, Atsuki ; Ueno, Ryuuichi ; Masuoka, Sadaaki ; Shishiguchi, Seiichi ; Nakajima, Ken ; Sakai, IsamiElectronics & communications in Japan. Part 2, Electronics, 1996, Vol.79 (11), p.28-35 [Periódico revisado por pares]New York: Wiley Subscription Services, Inc., A Wiley CompanyTexto completo disponível |
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7 |
Material Type: Artigo
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0.24-(mu)m CMOS technology and BSIM RF modeling for Bluetooth power applicationsChen, E ; Heo, D ; Laskar, J ; Bien, DMicrowave Journal, 2001-02, Vol.44 (2), p.142-152Dedham: Horizon House Publications, IncTexto completo disponível |
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8 |
Material Type: Ata de Congresso
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0.25/spl mu/m In/sub 0.52/Al/sub 0.48/As/In/sub 0.53/Ga/sub 0.47/As/InAs/sub 0.3/P/sub 0.7/ composite channel HEMTs with an f/sub T/ of 115GHzLiu, D. ; Hudait, M. ; Lin, Y. ; Kim, H. ; Ringel, S.A. ; Lu, W.2005 Asia-Pacific Microwave Conference Proceedings, 2005, Vol.2, p.3 pp.IEEETexto completo disponível |
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9 |
Material Type: Ata de Congresso
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0.32-μm pitch random line pattern formation by dense dummy pattern and double exposure in KrF wavelengthNakao, Shuji ; Tsujita, Kouichirou ; Arimoto, Ichiriou ; Wakamiya, WataruSPIE 2000Texto completo disponível |
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10 |
Material Type: Artigo
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0.43 J, 10 Hz Fourth Harmonic Generation of Nd:YAG Laser Using Large Li2B4O7 CrystalsSuzuki, Yuji ; Ono, Shingo ; Murakami, Hidetoshi ; Kozeki, Toshimasa ; Ohtake, Hideyuki ; Sarukura, Nobuhiko ; Masada, Genta ; Shiraishi, Hiroyuki ; Sekine, IchiroJapanese Journal of Applied Physics, 2002-07, Vol.41 (Part 2, No. 7B), p.L823-L824 [Periódico revisado por pares]Texto completo disponível |