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Residual stress gradient of Cr and CrN thin films
Residual stress gradient of Cr and CrN thin films
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Residual stress gradient of Cr and CrN thin films

Diego Fernando Arias Mateus A Gomez; Roberto Martins de Souza 1966-; Juan Manuel Velez

Materials Chemistry and Physics Lausanne : Elsevier v. 204, p. 269-276

Lausanne 2018

Item não circula. Consulte sua biblioteca.(Acessar)

2
Novel fluorescent Schiff bases as Al3+ sensors with high selectivity and sensitivity, and their bioimaging applications
Novel fluorescent Schiff bases as Al3+ sensors with high selectivity and sensitivity, and their bioimaging applications
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Novel fluorescent Schiff bases as Al3+ sensors with high selectivity and sensitivity, and their bioimaging applications

Berrones-Reyes, Jessica ; Muñoz-Flores, Blanca M. ; Gómez-Treviño, Alberto ; Treto-Suárez, Manuel A. ; Páez-Hernández, Dayan ; Schott, Eduardo ; Zarate, Ximena ; Jiménez-Pérez, Víctor M.

Materials chemistry and physics, 2019-05, Vol.233, p.89-101 [Periódico revisado por pares]

Elsevier B.V

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3
Effect of the surface chemical groups of activated carbons on their surface adsorptivity to aromatic adsorbates based on π-π interactions
Effect of the surface chemical groups of activated carbons on their surface adsorptivity to aromatic adsorbates based on π-π interactions
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Effect of the surface chemical groups of activated carbons on their surface adsorptivity to aromatic adsorbates based on π-π interactions

Godino-Salido, M. Luz ; López-Garzón, Rafael ; Gutiérrez-Valero, María D. ; Arranz-Mascarós, Paloma ; Melguizo-Guijarro, Manuel ; López de la Torre, María D. ; Gómez-Serrano, Vicente ; Alexandre-Franco, María ; Lozano-Castelló, Dolores ; Cazorla-Amorós, Diego ; Domingo-García, María

Materials chemistry and physics, 2014-02, Vol.143 (3), p.1489-1499 [Periódico revisado por pares]

Elsevier B.V

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  1. Recursos Online (2)
  2. Revistas revisadas por pares (2)

Autor/Criador 

  1. Velez, J  (1)
  2. Souza, R  (1)
  3. Arias Mateus, D  (1)
  4. Gomez, A  (1)
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Deste Autor:

  1. Velez, J
  2. Souza, R
  3. Arias Mateus, D
  4. Gomez, A

Neste Assunto:

  1. Materials Science
  2. Science & Technology
  3. Technology
  4. Materials Science, Multidisciplinary
  5. Chemical Techniques

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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