Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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Material Type: Artigo
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Effects of seed layer on the performance of microcrystalline silicon germanium solar cellsCao, Yu ; Zhang, Jianjun ; Li, Tianwei ; Huang, Zhenhua ; Ma, Jun ; Yang, Xu ; Ni, Jian ; Geng, Xinhua ; Zhao, YingJournal of semiconductors, 2013-03, Vol.34 (3), p.58-62 [Periódico revisado por pares]Texto completo disponível |
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2 |
Material Type: Artigo
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Influence of the initial transient state of plasma and hydrogen pre-treatment on the interface properties of a silicon heterojunction fabricated by PECVD武春波 周玉琴 李国荣 刘丰珍Journal of semiconductors, 2011-09, Vol.32 (9), p.147-150 [Periódico revisado por pares]IOP PublishingTexto completo disponível |
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3 |
Material Type: Artigo
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H-plasma-assisted aluminum induced crystallization of amorphous silicon李娟 刘宁 罗翀 孟志国 熊绍珍 Hoi Sing KwokJournal of semiconductors, 2012-06, Vol.33 (6), p.125-128 [Periódico revisado por pares]Texto completo disponível |
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4 |
Material Type: Artigo
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Prevention of plasma-induced damage on thin gate oxides in BEOL sub-half micron CMOS processing贺琪 赵文彬 彭力 于宗光Journal of semiconductors, 2013-06, Vol.34 (6), p.170-173 [Periódico revisado por pares]Texto completo disponível |
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5 |
Material Type: Artigo
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Simulation of cold plasma in a chamber under high- and low-frequency voltage conditions for a capacitively coupled plasma郝道欣 程嘉 季林红 孙钰淳Journal of semiconductors, 2012-10, Vol.33 (10), p.42-47 [Periódico revisado por pares]Texto completo disponível |
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6 |
Material Type: Artigo
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Spatial control based quantum well intermixing in InP/InGaAsP structures using ICP赵建宜 郭剑 黄晓东 周宁 刘文Journal of semiconductors, 2012-10, Vol.33 (10), p.134-137 [Periódico revisado por pares]Texto completo disponível |
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7 |
Material Type: Artigo
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Highly controllable ICP etching of GaAs based materials for grating fabrication邱伟彬 王加贤Journal of semiconductors, 2012-02, Vol.33 (2), p.149-153 [Periódico revisado por pares]Texto completo disponível |
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8 |
Material Type: Artigo
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Fluid model of inductively coupled plasma etcher based on COMSOL程嘉 季林红 朱煜 史翊翔Journal of semiconductors, 2010-03, Vol.31 (3), p.19-24 [Periódico revisado por pares]IOP PublishingTexto completo disponível |
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9 |
Material Type: Artigo
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Novel photoresist stripping technology using steam-water mixture王磊 惠瑜 高超群 景玉鹏Journal of semiconductors, 2011-02, Vol.32 (2), p.142-148 [Periódico revisado por pares]IOP PublishingTexto completo disponível |
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10 |
Material Type: Artigo
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Metal gate etch-back planarization technologyMeng, Lingkuan ; Yin, Huaxiang ; Chen, Dapeng ; Ye, TianchunJournal of semiconductors, 2012-03, Vol.33 (3), p.114-117 [Periódico revisado por pares]Texto completo disponível |