Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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On the E to H mode transition in a dual frequency (2 and 13.56 MHz) inductively coupled plasmaKim, Ju-Ho ; Chung, Chin-WookPhysics of plasmas, 2020-02, Vol.27 (2), p.023503 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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2 |
Material Type: Artigo
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Effect of electron kinetics on plasma density in inductively coupled plasmas using a passive resonant antennaKim, Ju-Ho ; Chung, Chin-WookPhysics of plasmas, 2020-06, Vol.27 (6), p.063511 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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3 |
Material Type: Artigo
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Effect of the RF bias on the plasma density in an argon inductively coupled plasmaLee, Ho-won ; Kim, Kyung-Hyun ; Seo, Jong In ; Chung, Chin-WookPhysics of plasmas, 2020-09, Vol.27 (9), p.093508 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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4 |
Material Type: Artigo
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Hysteresis control using a DC magnetic field in an argon inductively coupled plasmaKim, Tae-Woo ; Lee, Moo-Young ; Chung, Chin-WookPhysics of plasmas, 2021-12, Vol.28 (12), p.123518 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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5 |
Material Type: Artigo
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Ultrathin gutter layer for high-performance thin-film composite membranes for CO2 separationYoo, Myung Jin ; Kim, Kyung Hyun ; Lee, Jun Hyeok ; Kim, Tae Woo ; Chung, Chin Wook ; Cho, Young Hoon ; Park, Ho BumJournal of membrane science, 2018-11, Vol.566, p.336-345 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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6 |
Material Type: Artigo
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Control of the spatial distribution of ion flux in dual inductively coupled plasmasCho, Sung-Won ; Moon, Jun-Hyeon ; Zhang, Aixian ; Chung, Chin-WookJournal of applied physics, 2021-03, Vol.129 (10), p.103305 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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7 |
Material Type: Artigo
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Collisionless electron heating by radio frequency bias in low gas pressure inductive dischargeLee, Hyo-Chang ; Chung, Chin-WookApplied physics letters, 2012-12, Vol.101 (24), p.244104 [Periódico revisado por pares]United States: AIP PublishingTexto completo disponível |
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8 |
Material Type: Artigo
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Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmasLee, Hyo-Chang ; Chung, Chin-Wook ; Kim, J. H. ; Seong, D. J.Applied physics letters, 2019-08, Vol.115 (6), p.064102 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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9 |
Material Type: Artigo
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Nonlinear circuit analysis of intermodulation currents in a floating Langmuir probe with a capacitive loadKim, Kyung-Hyun ; Lee, Moo-Young ; Chung, Chin-WookPhysics of plasmas, 2020-03, Vol.27 (3), p.033508 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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10 |
Material Type: Artigo
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A monitoring device made of an anodic aluminum oxide template for plasma-induced charging potential measurements in the high-aspect-ratio trench structurePark, Ji-Hwan ; Chung, Chin-WookReview of scientific instruments, 2018-11, Vol.89 (11), p.115006-115006 [Periódico revisado por pares]United States: American Institute of PhysicsTexto completo disponível |