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Material Type: Artigo
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Atomic Layer Deposition of Hafnium Oxide on InAs: Insight from Time-Resolved in Situ StudiesD’Acunto, Giulio ; Troian, Andrea ; Kokkonen, Esko ; Rehman, Foqia ; Liu, Yen-Po ; Yngman, Sofie ; Yong, Zhihua ; McKibbin, Sarah R ; Gallo, Tamires ; Lind, Erik ; Schnadt, Joachim ; Timm, RainerACS applied electronic materials, 2020-12, Vol.2 (12), p.3915-3922 [Periódico revisado por pares]American Chemical SocietyTexto completo disponível |