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On the E to H mode transition in a dual frequency (2 and 13.56 MHz) inductively coupled plasma
On the E to H mode transition in a dual frequency (2 and 13.56 MHz) inductively coupled plasma
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On the E to H mode transition in a dual frequency (2 and 13.56 MHz) inductively coupled plasma

Kim, Ju-Ho ; Chung, Chin-Wook

Physics of plasmas, 2020-02, Vol.27 (2) [Periódico revisado por pares]

Melville: American Institute of Physics

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2
Effect of electron kinetics on plasma density in inductively coupled plasmas using a passive resonant antenna
Effect of electron kinetics on plasma density in inductively coupled plasmas using a passive resonant antenna
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Effect of electron kinetics on plasma density in inductively coupled plasmas using a passive resonant antenna

Kim, Ju-Ho ; Chung, Chin-Wook

Physics of plasmas, 2020-06, Vol.27 (6) [Periódico revisado por pares]

Melville: American Institute of Physics

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3
Hysteresis control using a DC magnetic field in an argon inductively coupled plasma
Hysteresis control using a DC magnetic field in an argon inductively coupled plasma
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Hysteresis control using a DC magnetic field in an argon inductively coupled plasma

Kim, Tae-Woo ; Lee, Moo-Young ; Chung, Chin-Wook

Physics of plasmas, 2021-12, Vol.28 (12) [Periódico revisado por pares]

Melville: American Institute of Physics

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4
Effect of the RF bias on the plasma density in an argon inductively coupled plasma
Effect of the RF bias on the plasma density in an argon inductively coupled plasma
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Effect of the RF bias on the plasma density in an argon inductively coupled plasma

Lee, Ho-won ; Kim, Kyung-Hyun ; Seo, Jong In ; Chung, Chin-Wook

Physics of plasmas, 2020-09, Vol.27 (9) [Periódico revisado por pares]

Melville: American Institute of Physics

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5
Control of the spatial distribution of ion flux in dual inductively coupled plasmas
Control of the spatial distribution of ion flux in dual inductively coupled plasmas
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Control of the spatial distribution of ion flux in dual inductively coupled plasmas

Cho, Sung-Won ; Moon, Jun-Hyeon ; Zhang, Aixian ; Chung, Chin-Wook

Journal of applied physics, 2021-03, Vol.129 (10) [Periódico revisado por pares]

Melville: American Institute of Physics

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6
Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas
Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas
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Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas

Lee, Hyo-Chang ; Chung, Chin-Wook ; Kim, J. H. ; Seong, D. J.

Applied physics letters, 2019-08, Vol.115 (6) [Periódico revisado por pares]

Melville: American Institute of Physics

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7
Nonlinear circuit analysis of intermodulation currents in a floating Langmuir probe with a capacitive load
Nonlinear circuit analysis of intermodulation currents in a floating Langmuir probe with a capacitive load
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Nonlinear circuit analysis of intermodulation currents in a floating Langmuir probe with a capacitive load

Kim, Kyung-Hyun ; Lee, Moo-Young ; Chung, Chin-Wook

Physics of plasmas, 2020-03, Vol.27 (3) [Periódico revisado por pares]

Melville: American Institute of Physics

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8
Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasma
Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasma
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Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasma

Lee, Nayeon ; Kwon, Ohyung ; Chung, Chin-Wook

AIP advances, 2021-02, Vol.11 (2), p.025027-025027-8 [Periódico revisado por pares]

Melville: American Institute of Physics

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9
A monitoring device made of an anodic aluminum oxide template for plasma-induced charging potential measurements in the high-aspect-ratio trench structure
A monitoring device made of an anodic aluminum oxide template for plasma-induced charging potential measurements in the high-aspect-ratio trench structure
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A monitoring device made of an anodic aluminum oxide template for plasma-induced charging potential measurements in the high-aspect-ratio trench structure

Park, Ji-Hwan ; Chung, Chin-Wook

Review of scientific instruments, 2018-11, Vol.89 (11), p.115006-115006 [Periódico revisado por pares]

United States: American Institute of Physics

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10
Electron-assisted PR etching in oxygen inductively coupled plasma via a low-energy electron beam
Electron-assisted PR etching in oxygen inductively coupled plasma via a low-energy electron beam
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Electron-assisted PR etching in oxygen inductively coupled plasma via a low-energy electron beam

Jung, Jiwon ; Kim, Min-Seok ; Park, Junyoung ; Lim, Chang-Min ; Hwang, Tae-Wung ; Seo, Beom-Jun ; Chung, Chin-Wook

Physics of plasmas, 2023-02, Vol.30 (2) [Periódico revisado por pares]

Melville: American Institute of Physics

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