Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
---|---|---|---|
1 |
Material Type: Artigo
|
Negative Capacitance FinFET With Sub-20-mV/decade Subthreshold Slope and Minimal Hysteresis of 0.48 VKo, Eunah ; Lee, Jae Woo ; Shin, ChanghwanIEEE electron device letters, 2017-04, Vol.38 (4), p.418-421 [Periódico revisado por pares]IEEETexto completo disponível |
|
2 |
Material Type: Artigo
|
First Demonstration of a Logic-Process Compatible Junctionless Ferroelectric FinFET Synapse for Neuromorphic ApplicationsSeo, Myungsoo ; Kang, Min-Ho ; Jeon, Seung-Bae ; Bae, Hagyoul ; Hur, Jae ; Jang, Byung Chul ; Yun, Seokjung ; Cho, Seongwoo ; Kim, Wu-Kang ; Kim, Myung-Su ; Hwang, Kyu-Man ; Hong, Seungbum ; Choi, Sung-Yool ; Choi, Yang-KyuIEEE electron device letters, 2018-09, Vol.39 (9), p.1445-1448 [Periódico revisado por pares]New York: IEEETexto completo disponível |
|
3 |
Material Type: Artigo
|
Negative Capacitance in Short-Channel FinFETs Externally Connected to an Epitaxial Ferroelectric CapacitorKhan, Asif Islam ; Chatterjee, Korok ; Duarte, Juan Pablo ; Zhongyuan Lu ; Sachid, Angada ; Khandelwal, Sourabh ; Ramesh, Ramamoorthy ; Chenming Hu ; Salahuddin, SayeefIEEE electron device letters, 2016-01, Vol.37 (1), p.111-114 [Periódico revisado por pares]New York: IEEETexto completo disponível |
|
4 |
Material Type: Artigo
|
High Speed and Large Memory Window Ferroelectric HfZrO₂ FinFET for High-Density Nonvolatile MemoryYan, Siao-Cheng ; Lan, Guan-Min ; Sun, Chong-Jhe ; Chen, Ya-Han ; Wu, Chen-Han ; Peng, Hao-Kai ; Lin, Yu-Hsien ; Wu, Yung-Hsien ; Wu, Yung-ChunIEEE electron device letters, 2021-09, Vol.42 (9), p.1307-1310 [Periódico revisado por pares]New York: IEEETexto completo disponível |
|
5 |
Material Type: Artigo
|
FinFET With Improved Subthreshold Swing and Drain Current Using 3-nm Ferroelectric Hf0.5Zr0.5O2Zhang, Zhaohao ; Xu, Gaobo ; Zhang, Qingzhu ; Hou, Zhaozhao ; Li, Junjie ; Kong, ZhenZhen ; Zhang, Yongkui ; Xiang, Jinjuan ; Xu, Qiuxia ; Wu, Zhenhua ; Zhu, Huilong ; Yin, Huaxiang ; Wang, Wenwu ; Ye, TianchunIEEE electron device letters, 2019-03, Vol.40 (3), p.367-370 [Periódico revisado por pares]New York: IEEETexto completo disponível |
|
6 |
Material Type: Artigo
|
Prediction of FinFET Current-Voltage and Capacitance-Voltage Curves Using Machine Learning With AutoencoderMehta, Kashyap ; Wong, Hiu-YungIEEE electron device letters, 2021-02, Vol.42 (2), p.136-139 [Periódico revisado por pares]New York: IEEETexto completo disponível |
|
7 |
Material Type: Artigo
|
Enhancement-Mode Ga2O3 Vertical Transistors With Breakdown Voltage >1 kVHu, Zongyang ; Nomoto, Kazuki ; Li, Wenshen ; Tanen, Nicholas ; Sasaki, Kohei ; Kuramata, Akito ; Nakamura, Tohru ; Jena, Debdeep ; Xing, Huili GraceIEEE electron device letters, 2018-06, Vol.39 (6), p.869-872 [Periódico revisado por pares]IEEETexto completo disponível |
|
8 |
Material Type: Artigo
|
Self-Curable Synaptor With Tri-Node Charge- Trap FinFET for Semi-Supervised LearningYu, Ji-Man ; Ham, Gyeongdo ; Kim, Seong-Yeon ; Kim, Jin-Ki ; Han, Joon-Kyu ; Yun, Seong-Yun ; Kim, Seonghak ; Lee, Sang-Won ; Jeon, Seung-Bae ; Kim, Dae-Shik ; Choi, Yang-KyuIEEE electron device letters, 2024-04, Vol.45 (4), p.716-719 [Periódico revisado por pares]IEEETexto completo disponível |
|
9 |
Material Type: Artigo
|
Demonstration of a GaN/AlGaN Superlattice-Based p-Channel FinFET With High ON-CurrentRaj, Aditya ; Krishna, Athith ; Hatui, Nirupam ; Gupta, Chirag ; Jang, Raina ; Keller, Stacia ; Mishra, Umesh K.IEEE electron device letters, 2020-02, Vol.41 (2), p.220-223 [Periódico revisado por pares]New York: IEEETexto completo disponível |
|
10 |
Material Type: Artigo
|
Experimental Demonstration of TreeFETs Combining Stacked Nanosheets and Low Doping Interbridges by Epitaxy and Wet EtchingTu, Chien-Te ; Hsieh, Wan-Hsuan ; Huang, Bo-Wei ; Chen, Yu-Rui ; Liu, Yi-Chun ; Tsai, Chung-En ; Chueh, Shee-Jier ; Liu, C. W.IEEE electron device letters, 2022-05, Vol.43 (5), p.682-685 [Periódico revisado por pares]New York: IEEETexto completo disponível |