Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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11 |
Material Type: Artigo
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Evaluation of dual-ONOFIC method for subthreshold leakage reduction in domino circuitMagraiya, Vijay Kumar ; Gupta, Tarun Kumar ; Verma, Rajesh ; Pandey, Amit Kumar ; Kori, Shiv PrasadInternational journal of electronics, 2023-11, p.1-17 [Periódico revisado por pares]Texto completo disponível |
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12 |
Material Type: Artigo
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Comparative study of novel u-shaped SOI FinFET against multiple-fin bulk/SOI FinFETSon, Myoungsu ; Sung, Juho ; Baac, Hyoung Won ; Shin, ChanghwanIEEE access, 2023-01, Vol.11, p.1-1 [Periódico revisado por pares]IEEETexto completo disponível |
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13 |
Material Type: Artigo
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The Investigation of Reduced Variation Effect in FinFETs With Ultrathin 3-nm Ferroelectric Hf₀.₅Zr₀.₅OZhang, Fan ; Zhang, Zhaohao ; Yao, Jiaxin ; Zhu, Xiaohui ; Peng, Yue ; Huo, Jiali ; Zhang, Qingzhu ; Xu, Gaobo ; Wu, Zhenhua ; Han, Genquan ; Liu, Yan ; Yin, HuaxiangIEEE transactions on electron devices, 2024-05, Vol.71 (5), p.2876-2880 [Periódico revisado por pares]IEEETexto completo disponível |
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14 |
Material Type: Artigo
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The Silicon Age: Trends in Semiconductor Devices IndustryKamal, Kamal Y.Journal of engineering science and technology review, 2022, Vol.15 (1), p.110-115 [Periódico revisado por pares]Sem texto completo |
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15 |
Material Type: Artigo
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Dependence of RF/Analog and Linearity Figure of Merits on Temperature in Ferroelectric FinFET: A Simulation StudySaha, Rajesh ; Goswami, Rupam ; Bhowmick, Brinda ; Baishya, SrimantaIEEE transactions on ultrasonics, ferroelectrics, and frequency control, 2020-11, Vol.67 (11), p.2433-2439 [Periódico revisado por pares]New York: IEEETexto completo disponível |
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16 |
Material Type: Artigo
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Device Exploration of NanoSheet Transistors for Sub-7-nm Technology NodeDoyoung Jang ; Yakimets, Dmitry ; Eneman, Geert ; Schuddinck, Pieter ; Bardon, Marie Garcia ; Raghavan, Praveen ; Spessot, Alessio ; Verkest, Diederik ; Mocuta, AndaIEEE transactions on electron devices, 2017-06, Vol.64 (6), p.2707-2713 [Periódico revisado por pares]IEEETexto completo disponível |
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17 |
Material Type: Artigo
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Negative Capacitance FinFET With Sub-20-mV/decade Subthreshold Slope and Minimal Hysteresis of 0.48 VKo, Eunah ; Lee, Jae Woo ; Shin, ChanghwanIEEE electron device letters, 2017-04, Vol.38 (4), p.418-421 [Periódico revisado por pares]IEEETexto completo disponível |
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18 |
Material Type: Artigo
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Comparison of Carrier Deflection between MAG-TFET and MAG-FinFETBoonlua, Thanet ; Poyai, Amporn ; Phetchakul, ToempongMaterials science forum, 2023-07, Vol.1094, p.145-151 [Periódico revisado por pares]Sem texto completo |
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19 |
Material Type: Artigo
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The Effects of Threshold Voltage and Number of Fins Per Transistor on the TID Response of GF 12LP TechnologyVidana, Aldo I. ; Dodds, Nathaniel A. ; Nowlin, R. Nathan ; Wallace, Trace M. ; Oldiges, Phil J. ; Dodd, Brian M. ; Xiong, Jenny ; Cadena, Rick M. ; Trippe, James ; Kauppila, Jeffrey S. ; Massengill, Lloyd W. ; Barnaby, Hugh J.IEEE transactions on nuclear science, 2024-04, Vol.71 (4), p.477-484 [Periódico revisado por pares]New York: IEEETexto completo disponível |
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20 |
Material Type: Artigo
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Reliability analysis of a CNT-TF-FinFET for hostile temperatureSrivastava, Praween Kumar ; Kumar, Atul ; Kumar, Ajaye-Prime, 2023-12, Vol.6, p.100374, Article 100374 [Periódico revisado por pares]ElsevierTexto completo disponível |