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Application of DERI method to InN/InGaN MQW, thick InGaN and InGaN/InGaN MQW structure growth
Application of DERI method to InN/InGaN MQW, thick InGaN and InGaN/InGaN MQW structure growth
Material Type:
Acta de Congreso 		Añadir a Mi Portal

Application of DERI method to InN/InGaN MQW, thick InGaN and InGaN/InGaN MQW structure growth

Yamaguchi, T ; Wang, K ; Araki, T ; Honda, T ; Yoon, E ; Nanishi, Y Nanishi, Yasushi ; Morkoç, Hadis ; Yoon, Euijoon ; Fujioka, Hiroshi ; Piprek, Joachim ; Chyi, Jen-Inn

SPIE 2013

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2
A simple modeling of carbon contamination on EUV exposure tools based on contamination experiments with synchrotron source
A simple modeling of carbon contamination on EUV exposure tools based on contamination experiments with synchrotron source
Material Type:
Acta de Congreso 		Añadir a Mi Portal

A simple modeling of carbon contamination on EUV exposure tools based on contamination experiments with synchrotron source

SHIRAISHI, M ; YAMAGUCHI, T ; YAMAZAKI, A ; KANDAKA, N ; OSHINO, T ; MURAKAMI, K

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7969

Bellingham, Wash: SPIE

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3
Contamination study on EUV exposure tools using SAGA Light Source (SAGA-LS)
Contamination study on EUV exposure tools using SAGA Light Source (SAGA-LS)
Material Type:
Acta de Congreso 		Añadir a Mi Portal

Contamination study on EUV exposure tools using SAGA Light Source (SAGA-LS)

MURAKAMI, K ; YAMAGUCHI, T ; YAMAZAKI, A ; KANDAKA, N ; SHIRAISHI, M ; MASTUNARI, S ; AOKI, T ; KAWATA, S

Proceedings of SPIE, the International Society for Optical Engineering, 2010, Vol.7636

Bellingham: SPIE

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4
Photo-deprotection resist based on photolysis of o-nitrobenzyl phenol ether: challenge to half-pitch 22 nm using near-field lithography
Photo-deprotection resist based on photolysis of o-nitrobenzyl phenol ether: challenge to half-pitch 22 nm using near-field lithography
Material Type:
Acta de Congreso 		Añadir a Mi Portal

Photo-deprotection resist based on photolysis of o-nitrobenzyl phenol ether: challenge to half-pitch 22 nm using near-field lithography

Ito, T ; Terao, A ; Inao, Y ; Yamaguchi, T ; Mizutani, N

Proceedings of SPIE, the International Society for Optical Engineering, 2007, Vol.6519, p.65190J-65190J-8

Bellingham, Wash: SPIE

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5
Fabrication of position-controlled InN nanocolumns by ECR-MBE
Fabrication of position-controlled InN nanocolumns by ECR-MBE
Material Type:
Acta de Congreso 		Añadir a Mi Portal

Fabrication of position-controlled InN nanocolumns by ECR-MBE

Araki, T ; Fukuoka, D ; Tamiya, H ; Harui, S ; Miyake, H ; Hiramatsu, K ; Nanishi, Y

Proceedings of SPIE, the International Society for Optical Engineering, 2009, Vol.7216, p.72160N-72160N-8

Bellingham, Wash: SPIE

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6
Fabrication of Plasmonic Nanopore Array for Biomolecule Sensor
Fabrication of Plasmonic Nanopore Array for Biomolecule Sensor
Material Type:
Acta de Congreso 		Añadir a Mi Portal

Fabrication of Plasmonic Nanopore Array for Biomolecule Sensor

CHOI, S. S ; PARK, M. J ; KIM, D. S ; PARK, N. K ; PARK, K. J ; YAMAGUCHI, T

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.8031

Bellingham, Wash: SPIE

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7
Effects of short-day photoperiod on the growth of asparagus in autumn
Effects of short-day photoperiod on the growth of asparagus in autumn
Material Type:
Acta de Congreso 		Añadir a Mi Portal

Effects of short-day photoperiod on the growth of asparagus in autumn

Yamaguchi, T

Acta horticulturae, 2012 (950), p.253-260 [Revista revisada por pares]

International Society for Horticultural Science

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8
Controlling the nanopore fabrication using high energy electron beam exposure
Controlling the nanopore fabrication using high energy electron beam exposure
Material Type:
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Controlling the nanopore fabrication using high energy electron beam exposure

Choi, S. S ; Park, M. J ; Yamaguchi, T ; Park, N. K Ray, Krishanu ; Lakowicz, Joseph R ; Vo-Dinh, Tuan

SPIE 2013

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9
Self-assembled monolayers on gold nanospheres studied by optical second-harmonic generation
Self-assembled monolayers on gold nanospheres studied by optical second-harmonic generation
Material Type:
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Self-assembled monolayers on gold nanospheres studied by optical second-harmonic generation

YAMAGUCHI, T ; KAJIKAWA, K

Proceedings of SPIE, the International Society for Optical Engineering, 2008, Vol.7033, p.70330O.1-70330O.8

Bellingham, Wash: SPIE

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10
Mass Measurements of Proton-rich Nuclides at the Cooler Storage Ring at IMP
Mass Measurements of Proton-rich Nuclides at the Cooler Storage Ring at IMP
Material Type:
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Mass Measurements of Proton-rich Nuclides at the Cooler Storage Ring at IMP

Zhang, Y. H. ; Xu, H. S. ; Wang, M. ; Zhou, X. H. ; Yuan, Y. J. ; Xia, J. W. ; Hu, Z. G. ; Huang, W. X. ; Liu, Y. ; Ma, X. ; Mao, R. S. ; Mei, B. ; Sun, Z. Y. ; Wang, J. S. ; Xiao, G. Q. ; Yan, X. L. ; Yang, J. C. ; Zhao, H. W. ; Zhao, T. C. ; Zhang, X. Y.

AIP conference proceedings, 2011, Vol.1409 (1) [Revista revisada por pares]

United States

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