Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Liquid transfer imprint lithography: A new route to residual layer thickness controlKoo, Namil ; Wuk Kim, Jung ; Otto, Martin ; Moormann, Christian ; Kurz, HeinrichJournal of vacuum science and technology. B, Nanotechnology & microelectronics, 2011-11, Vol.29 (6) [Periódico revisado por pares]Texto completo disponível |
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2 |
Material Type: Artigo
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Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS materialKoo, Namil ; Bender, Markus ; Plachetka, Ulrich ; Fuchs, Andreas ; Wahlbrink, Thorsten ; Bolten, Jens ; Kurz, HeinrichMicroelectronic engineering, 2007-05, Vol.84 (5), p.904-908 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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3 |
Material Type: Artigo
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Tailored etching processes for UV-NIL resist material for Si-antireflective surfacesPlachetka, Ulrich ; Kim, Jung Wuk ; Khandelwal, Rahul ; Windgassen, Horst ; Moormann, Christian ; Kurz, HeinrichMicroelectronic engineering, 2013-10, Vol.110, p.361-364 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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4 |
Material Type: Artigo
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Press and release imprint: Control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NILKoo, Namil ; Otto, Martin ; Kim, Jung Wuk ; Jeong, Jun-Ho ; Kurz, HeinrichMicroelectronic engineering, 2011-06, Vol.88 (6), p.1033-1036 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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5 |
Material Type: Artigo
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Fabrication of high efficiency SOI taper structuresWahlbrink, Thorsten ; Tsai, Wan Shao ; Waldow, Michael ; Först, Michael ; Bolten, Jens ; Mollenhauer, Thomas ; Kurz, HeinrichMicroelectronic engineering, 2009-04, Vol.86 (4), p.1117-1119 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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6 |
Material Type: Artigo
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A Graphene Field-Effect DeviceLemme, M.C. ; Echtermeyer, T.J. ; Baus, M. ; Kurz, H.IEEE electron device letters, 2007-04, Vol.28 (4), p.282-284 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
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7 |
Material Type: Artigo
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Silicon-Organic Hybrid Electro-Optical DevicesLeuthold, Juerg ; Koos, Christian ; Freude, Wolfgang ; Alloatti, Luca ; Palmer, Robert ; Korn, Dietmar ; Pfeifle, Joerg ; Lauermann, Matthias ; Dinu, Raluca ; Wehrli, Silvan ; Jazbinsek, Mojca ; Gunter, Peter ; Waldow, Michael ; Wahlbrink, Thorsten ; Bolten, Jens ; Kurz, Heinrich ; Fournier, Maryse ; Fedeli, Jean-Marc ; Hui Yu ; Bogaerts, WimIEEE journal of selected topics in quantum electronics, 2013-11, Vol.19 (6), p.114-126 [Periódico revisado por pares]New York: IEEETexto completo disponível |
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8 |
Material Type: Artigo
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Simulation of Energy Production by Bifacial Modules with Revision of Ground ReflectionYusufoglu, Ufuk Alper ; Lee, Tae Hun ; Pletzer, Tobias Markus ; Halm, Andreas ; Koduvelikulathu, Lejo Joseph ; Comparotto, Corrado ; Kopecek, Radovan ; Kurz, HeinrichEnergy procedia, 2014, Vol.55, p.389-395 [Periódico revisado por pares]Elsevier LtdSem texto completo |
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9 |
Material Type: Artigo
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Study on fabrication tolerances of SOI based directional couplers and ring resonatorsPrinzen, Andreas ; Bolten, Jens ; Waldow, Michael ; Kurz, HeinrichMicroelectronic engineering, 2014-06, Vol.121, p.51-54 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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10 |
Material Type: Artigo
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Nonvolatile Switching in Graphene Field-Effect DevicesEchtermeyer, T.J. ; Lemme, M.C. ; Baus, M. ; Szafranek, B.N. ; Geim, A.K. ; Kurz, H.IEEE electron device letters, 2008-08, Vol.29 (8), p.952-954 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |