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Refinado por: autor: Koo, Namil remover
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Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material
Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material
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Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material

Koo, Namil ; Bender, Markus ; Plachetka, Ulrich ; Fuchs, Andreas ; Wahlbrink, Thorsten ; Bolten, Jens ; Kurz, Heinrich

Microelectronic engineering, 2007-05, Vol.84 (5), p.904-908 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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2
Liquid transfer imprint lithography: A new route to residual layer thickness control
Liquid transfer imprint lithography: A new route to residual layer thickness control
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Liquid transfer imprint lithography: A new route to residual layer thickness control

Koo, Namil ; Wuk Kim, Jung ; Otto, Martin ; Moormann, Christian ; Kurz, Heinrich

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2011-11, Vol.29 (6), p.06FC12-06FC12-4 [Periódico revisado por pares]

American Vacuum Society

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3
Definition of 15nm half pitch grating structures by electron beam lithography double exposure techniques
Definition of 15nm half pitch grating structures by electron beam lithography double exposure techniques
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Definition of 15nm half pitch grating structures by electron beam lithography double exposure techniques

Bolten, Jens ; Koo, Namil ; Wahlbrink, Thorsten ; Kurz, Heinrich

Microelectronic engineering, 2013-10, Vol.110, p.224-228 [Periódico revisado por pares]

Elsevier B.V

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4
The fabrication of a flexible mold for high resolution soft ultraviolet nanoimprint lithography
The fabrication of a flexible mold for high resolution soft ultraviolet nanoimprint lithography
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The fabrication of a flexible mold for high resolution soft ultraviolet nanoimprint lithography

Koo, Namil ; Plachetka, Ulrich ; Otto, Martin ; Bolten, Jens ; Jeong, Jun-ho ; Lee, Eung-sug ; Kurz, Heinrich

Nanotechnology, 2008-06, Vol.19 (22), p.225304-225304 [Periódico revisado por pares]

England: IOP Publishing

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5
Press and release imprint: Control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL
Press and release imprint: Control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL
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Press and release imprint: Control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL

Koo, Namil ; Otto, Martin ; Kim, Jung Wuk ; Jeong, Jun-Ho ; Kurz, Heinrich

Microelectronic engineering, 2011-06, Vol.88 (6), p.1033-1036 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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6
Definition of 15 nm half pitch grating structures by electron beam lithography double exposure techniques
Definition of 15 nm half pitch grating structures by electron beam lithography double exposure techniques
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Definition of 15 nm half pitch grating structures by electron beam lithography double exposure techniques

Bolten, J ; Koo, N ; Wahlbrink, T ; Kurz, H

Microelectronic engineering, 2013-10, Vol.110, p.224-228 [Periódico revisado por pares]

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7
Fabrication of MOSFETs by 3D soft UV-nanoimprint
Fabrication of MOSFETs by 3D soft UV-nanoimprint
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Fabrication of MOSFETs by 3D soft UV-nanoimprint

Koo, Namil ; Schmidt, Mathias ; Mollenhauer, Thomas ; Moormann, Christian ; Schlachter, Florian ; Kurz, Heinrich

Microelectronic engineering, 2012-09, Vol.97, p.85-88 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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8
Improved CD control and line edge roughness in E-beam lithography through combining proximity effect correction with gray scale techniques
Improved CD control and line edge roughness in E-beam lithography through combining proximity effect correction with gray scale techniques
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Improved CD control and line edge roughness in E-beam lithography through combining proximity effect correction with gray scale techniques

Bolten, Jens ; Wahlbrink, Thorsten ; Koo, Namil ; Kurz, Heinrich ; Stammberger, Stefan ; Hofmann, Uli ; Ünal, Nezih

Microelectronic engineering, 2010-05, Vol.87 (5), p.1041-1043 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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9
Definition of 15 nm half pitch grating structures by electron beam lithography double exposure techniques : Nanolithography 2012
Definition of 15 nm half pitch grating structures by electron beam lithography double exposure techniques : Nanolithography 2012
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Definition of 15 nm half pitch grating structures by electron beam lithography double exposure techniques : Nanolithography 2012

BOLTEN, Jens ; KOO, Namil ; WAHLBRINK, Thorsten ; KURZ, Heinrich

Microelectronic engineering, 2013, Vol.110, p.224-228 [Periódico revisado por pares]

Amsterdam: Elsevier

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10
The fabrication of a flexible mold for highresolution soft ultraviolet nanoimprint lithography
The fabrication of a flexible mold for highresolution soft ultraviolet nanoimprint lithography
Material Type:
Artigo 		Adicionar ao Meu Espaço

The fabrication of a flexible mold for highresolution soft ultraviolet nanoimprint lithography

Koo, Namil ; Plachetka, Ulrich ; Otto, Martin ; Bolten, Jens ; Jeong, Jun-ho ; Lee, Eung-sug ; Kurz, Heinrich

Nanotechnology, 2008-06, Vol.19 (22), p.225304 (4)-225304 (4) [Periódico revisado por pares]

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