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1
Nanopatterning of ultrananocrystalline diamond thin films via block copolymer lithography
Nanopatterning of ultrananocrystalline diamond thin films via block copolymer lithography
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Nanopatterning of ultrananocrystalline diamond thin films via block copolymer lithography

Ramanathan, Muruganathan ; Darling, Seth B. ; Sumant, Anirudha V. ; Auciello, Orlando

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-07, Vol.28 (4), p.979-983 [Periódico revisado por pares]

American Vacuum Society

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2
History of atomic layer deposition and its relationship with the American Vacuum Society
History of atomic layer deposition and its relationship with the American Vacuum Society
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History of atomic layer deposition and its relationship with the American Vacuum Society

Parsons, Gregory N. ; Elam, Jeffrey W. ; George, Steven M. ; Haukka, Suvi ; Jeon, Hyeongtag ; (Erwin) Kessels, W. M. M. ; Leskelä, Markku ; Poodt, Paul ; Ritala, Mikko ; Rossnagel, Steven M.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-09, Vol.31 (5) [Periódico revisado por pares]

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3
Effect of incubation time on preparation of continuous and flat Ru films
Effect of incubation time on preparation of continuous and flat Ru films
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Effect of incubation time on preparation of continuous and flat Ru films

Funakubo, Hiroshi ; Shiraishi, Takahisa ; Oikawa, Takahiro ; Hirano, Masaki ; Chiba, Hirokazu ; Kawano, Kazuhisa

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2015-01, Vol.33 (1) [Periódico revisado por pares]

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4
Atomic layer deposition of ZnO on Cu-nanoclusters for methanol synthesis
Atomic layer deposition of ZnO on Cu-nanoclusters for methanol synthesis
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Atomic layer deposition of ZnO on Cu-nanoclusters for methanol synthesis

Zhang, Ziyu ; Patterson, Matthew ; Ren, Maoming ; Wang, Ying ; Flake, John C. ; Sprunger, Phillip T. ; Kurtz, Richard L.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-01, Vol.31 (1) [Periódico revisado por pares]

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5
Cosputtered composition-spread reproducibility established by high-throughput x-ray fluorescence
Cosputtered composition-spread reproducibility established by high-throughput x-ray fluorescence
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Cosputtered composition-spread reproducibility established by high-throughput x-ray fluorescence

Gregoire, John M. ; Dale, Darren ; Kazimirov, Alexander ; DiSalvo, Francis J. ; Bruce van Dover, R.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-09, Vol.28 (5), p.1279-1280 [Periódico revisado por pares]

United States: American Vacuum Society

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6
Measurements of photon stimulated desorption from thick and thin oxide of KEKB collider copper beam chambers and a stainless steel beam chamber
Measurements of photon stimulated desorption from thick and thin oxide of KEKB collider copper beam chambers and a stainless steel beam chamber
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Measurements of photon stimulated desorption from thick and thin oxide of KEKB collider copper beam chambers and a stainless steel beam chamber

Foerster, C. L. ; Lanni, C. ; Kanazawa, K.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2001-07, Vol.19 (4), p.1652-1656 [Periódico revisado por pares]

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7
Atomic layer deposition of titanium phosphate on silica nanoparticles
Atomic layer deposition of titanium phosphate on silica nanoparticles
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Atomic layer deposition of titanium phosphate on silica nanoparticles

Wiedmann, Monika K. ; Jackson, David H. K. ; Pagan-Torres, Yomaira J. ; Cho, Eunkyung ; Dumesic, James A. ; Kuech, T. F.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1), p.01A134-01A134-8 [Periódico revisado por pares]

American Vacuum Society

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8
Reactive magnetron sputter deposition of niobium nitride films
Reactive magnetron sputter deposition of niobium nitride films
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Reactive magnetron sputter deposition of niobium nitride films

Wong, M. S. ; Sproul, W. D. ; Chu, X. ; Barnett, S. A.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1993-07, Vol.11 (4), p.1528-1533 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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9
Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayers
Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayers
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Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayers

Chun, J.-S. ; Carlsson, J. R. A. ; Desjardins, P. ; Bergstrom, D. B. ; Petrov, I. ; Greene, J. E. ; Lavoie, C. ; Cabral, C. ; Hultman, L.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-01, Vol.19 (1), p.182-191 [Periódico revisado por pares]

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10
Laser‐assisted chemical vapor deposition of InN on Si(100)
Laser‐assisted chemical vapor deposition of InN on Si(100)
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Laser‐assisted chemical vapor deposition of InN on Si(100)

Bu, Y. ; Ma, L. ; Lin, M. C.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1993, Vol.11 (6), p.2931-2937 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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