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Formation and optical properties of multi-stack InGaAs quantum dots embedded in GaAs nanowires by selective metalorganic chemical vapor deposition
Formation and optical properties of multi-stack InGaAs quantum dots embedded in GaAs nanowires by selective metalorganic chemical vapor deposition
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Formation and optical properties of multi-stack InGaAs quantum dots embedded in GaAs nanowires by selective metalorganic chemical vapor deposition

Tatebayashi, J. ; Ota, Y. ; Ishida, S. ; Nishioka, M. ; Iwamoto, S. ; Arakawa, Y.

Journal of crystal growth, 2013-05, Vol.370, p.299-302 [Peer Reviewed Journal]

Amsterdam: Elsevier B.V

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2
New method to isolate and distribute photoluminescence emissions from InAs quantum dots over a wide-wavelength range
New method to isolate and distribute photoluminescence emissions from InAs quantum dots over a wide-wavelength range
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New method to isolate and distribute photoluminescence emissions from InAs quantum dots over a wide-wavelength range

Ohkouchi, S. ; Kumagai, N. ; Shirane, M. ; Igarashi, Y. ; Nomura, M. ; Ota, Y. ; Yorozu, S. ; Iwamoto, S. ; Arakawa, Y.

Journal of crystal growth, 2011-05, Vol.323 (1), p.250-253 [Peer Reviewed Journal]

Amsterdam: Elsevier B.V

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3
AFM measurement of atomic-scale Si surface etching by active oxidation
AFM measurement of atomic-scale Si surface etching by active oxidation
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AFM measurement of atomic-scale Si surface etching by active oxidation

Morita, Y. ; Migita, S. ; Mizubayashi, W. ; Ota, H.

Surface science, 2010-08, Vol.604 (17), p.1432-1437 [Peer Reviewed Journal]

Kidlington: Elsevier B.V

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4
Spark plasma sintering technique for reaction sintering of Al2O3/Ni nanocomposite and its mechanical properties
Spark plasma sintering technique for reaction sintering of Al2O3/Ni nanocomposite and its mechanical properties
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Spark plasma sintering technique for reaction sintering of Al2O3/Ni nanocomposite and its mechanical properties

ISOBE, Toshihiro ; DAIMON, Keiji ; SATO, Toshihiko ; MATSUBARA, Takashi ; HIKICHI, Yasuo ; OTA, Toshitaka

Ceramics international, 2008, Vol.34 (1), p.213-217 [Peer Reviewed Journal]

Kidlington: Elsevier Science

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5
Flexible Ceramics in the System KZr2(PO4)3-KAlSi2O6 Prepared by Mimicking the Microstructure of Itacolumite
Flexible Ceramics in the System KZr2(PO4)3-KAlSi2O6 Prepared by Mimicking the Microstructure of Itacolumite
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Flexible Ceramics in the System KZr2(PO4)3-KAlSi2O6 Prepared by Mimicking the Microstructure of Itacolumite

Sato, Isshu ; Ichikawa, Yoshitaka ; Sakanoue, Junji ; Mizutani, Mamoru ; Adachi, Nobuyasu ; Ota, Toshitaka

Journal of the American Ceramic Society, 2008-02, Vol.91 (2), p.607-610 [Peer Reviewed Journal]

Malden, USA: Blackwell Publishing Inc

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6
Preparation and properties of Al2O3/Ni composite from NiAl2O4 spinel by in situ reaction sintering method
Preparation and properties of Al2O3/Ni composite from NiAl2O4 spinel by in situ reaction sintering method
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Preparation and properties of Al2O3/Ni composite from NiAl2O4 spinel by in situ reaction sintering method

ISOBE, Toshihiro ; DAIMON, Keiji ; ITO, Kazunori ; MATSUBARA, Takashi ; HIKICHI, Yasuo ; OTA, Toshitaka

Ceramics international, 2007-09, Vol.33 (7), p.1211-1215 [Peer Reviewed Journal]

Kidlington: Elsevier Science

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7
Fabrication of indium–tin-oxide films by dip coating process using ethanol solution of chlorides and surfactants
Fabrication of indium–tin-oxide films by dip coating process using ethanol solution of chlorides and surfactants
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Fabrication of indium–tin-oxide films by dip coating process using ethanol solution of chlorides and surfactants

Ota, R ; Seki, S ; Ogawa, M ; Nishide, T ; Shida, A ; Ide, M ; Sawada, Y

Thin solid films, 2002-05, Vol.411 (1), p.42-45 [Peer Reviewed Journal]

Lausanne: Elsevier B.V

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8
Chemical solution deposition of conductive SrRuO3 thin film on Si substrate
Chemical solution deposition of conductive SrRuO3 thin film on Si substrate
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Chemical solution deposition of conductive SrRuO3 thin film on Si substrate

SUZUKI, Hisao ; MIWA, Yuki ; MIYAZAKI, Hidetoshi ; TAKAHASHI, Minom ; OTA, Toshitaka

Ceramics international, 2004, Vol.30 (7), p.1357-1360 [Peer Reviewed Journal]

Kidlington: Elsevier Science

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9
Epitaxial Bi4Ti3O12 thin film growth using Bi self-limiting function
Epitaxial Bi4Ti3O12 thin film growth using Bi self-limiting function
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Epitaxial Bi4Ti3O12 thin film growth using Bi self-limiting function

MIGITA, S ; OTA, H ; FUJINO, H ; KASAI, Y ; SAKAI, S

Journal of crystal growth, 1999-04, Vol.200 (1-2), p.161-168 [Peer Reviewed Journal]

Amsterdam: Elsevier

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