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Formation and optical properties of multi-stack InGaAs quantum dots embedded in GaAs nanowires by selective metalorganic chemical vapor deposition
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Formation and optical properties of multi-stack InGaAs quantum dots embedded in GaAs nanowires by selective metalorganic chemical vapor deposition

Tatebayashi, J. ; Ota, Y. ; Ishida, S. ; Nishioka, M. ; Iwamoto, S. ; Arakawa, Y.

Journal of crystal growth, 2013-05, Vol.370, p.299-302 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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2
New method to isolate and distribute photoluminescence emissions from InAs quantum dots over a wide-wavelength range
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New method to isolate and distribute photoluminescence emissions from InAs quantum dots over a wide-wavelength range

Ohkouchi, S. ; Kumagai, N. ; Shirane, M. ; Igarashi, Y. ; Nomura, M. ; Ota, Y. ; Yorozu, S. ; Iwamoto, S. ; Arakawa, Y.

Journal of crystal growth, 2011-05, Vol.323 (1), p.250-253 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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3
Charged and neutral biexciton–exciton cascade in a single quantum dot within a photonic bandgap
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Charged and neutral biexciton–exciton cascade in a single quantum dot within a photonic bandgap

Shirane, M. ; Igarashi, Y. ; Ota, Y. ; Nomura, M. ; Kumagai, N. ; Ohkouchi, S. ; Kirihara, A. ; Ishida, S. ; Iwamoto, S. ; Yorozu, S. ; Arakawa, Y.

Physica. E, Low-dimensional systems & nanostructures, 2010-09, Vol.42 (10), p.2563-2566 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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4
Suppression of indefinite peaks in InAs/GaAs quantum dot spectrum by low temperature capping in the indium-flush method
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Suppression of indefinite peaks in InAs/GaAs quantum dot spectrum by low temperature capping in the indium-flush method

Kumagai, N. ; Ohkouchi, S. ; Nakagawa, S. ; Nomura, M. ; Ota, Y. ; Shirane, M. ; Igarashi, Y. ; Yorozu, S. ; Iwamoto, S. ; Arakawa, Y.

Physica. E, Low-dimensional systems & nanostructures, 2010-09, Vol.42 (10), p.2753-2756 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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5
Film structure and magnetic properties of CoNiCr/Cr sputtered thin film
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Film structure and magnetic properties of CoNiCr/Cr sputtered thin film

Ishikawa, M. ; Tani, N. ; Yamada, T. ; Ota, Y. ; Nakamura, K. ; Itoh, A.

IEEE transactions on magnetics, 1986-09, Vol.22 (5), p.573-575

New York, NY: IEEE

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6
Kerr effect of CO-O films
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Kerr effect of CO-O films

Ota, Y. ; Asaka, T. ; Asari, S. ; Nakamura, K. ; Itoh, A.

IEEE transactions on magnetics, 1984-09, Vol.20 (5), p.1030-1032

New York, NY: IEEE

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7
AFM measurement of atomic-scale Si surface etching by active oxidation
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AFM measurement of atomic-scale Si surface etching by active oxidation

Morita, Y. ; Migita, S. ; Mizubayashi, W. ; Ota, H.

Surface science, 2010-08, Vol.604 (17), p.1432-1437 [Periódico revisado por pares]

Kidlington: Elsevier B.V

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8
Preparation and evaluation of LaNiO3 thin film electrode with chemical solution deposition
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Preparation and evaluation of LaNiO3 thin film electrode with chemical solution deposition

MIYAZAKI, Hidetoshi ; GOTO, Takashi ; MIWA, Yuki ; OHNO, Tomoya ; SUZUKI, Hisao ; OTA, Toshitaka ; TAKAHASHI, Minoru WCA

Journal of the European Ceramic Society, 2004, Vol.24 (6), p.1005-1008 [Periódico revisado por pares]

Oxford: Elsevier

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9
Subcellular Resolution Mapping of Endogenous Cytokine Secretion by Nano-Plasmonic-Resonator Sensor Array
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Subcellular Resolution Mapping of Endogenous Cytokine Secretion by Nano-Plasmonic-Resonator Sensor Array

Wang, Sheng ; Ota, Sadao ; Guo, Bin ; Ryu, Jongeun ; Rhodes, Christopher ; Xiong, Yi ; Kalim, Sheraz ; Zeng, Li ; Chen, Yong ; Teitell, Michael A ; Zhang, Xiang

Nano letters, 2011-08, Vol.11 (8), p.3431-3434 [Periódico revisado por pares]

Washington, DC: American Chemical Society

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10
Fabrication of indium–tin-oxide films by dip coating process using ethanol solution of chlorides and surfactants
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Fabrication of indium–tin-oxide films by dip coating process using ethanol solution of chlorides and surfactants

Ota, R ; Seki, S ; Ogawa, M ; Nishide, T ; Shida, A ; Ide, M ; Sawada, Y

Thin solid films, 2002-05, Vol.411 (1), p.42-45 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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