Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Ion energy distribution measurement device using a capillary plate with high-aspect ratioLee, Ho-Won ; Kim, Ju-Ho ; Chung, Chin-WookPhysics of plasmas, 2023-12, Vol.30 (12) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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2 |
Material Type: Artigo
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On the E to H mode transition in a dual frequency (2 and 13.56 MHz) inductively coupled plasmaKim, Ju-Ho ; Chung, Chin-WookPhysics of plasmas, 2020-02, Vol.27 (2) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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3 |
Material Type: Artigo
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Ultrathin gutter layer for high-performance thin-film composite membranes for CO2 separationYoo, Myung Jin ; Kim, Kyung Hyun ; Lee, Jun Hyeok ; Kim, Tae Woo ; Chung, Chin Wook ; Cho, Young Hoon ; Park, Ho BumJournal of membrane science, 2018-11, Vol.566, p.336-345 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |
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4 |
Material Type: Artigo
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Effect of electron kinetics on plasma density in inductively coupled plasmas using a passive resonant antennaKim, Ju-Ho ; Chung, Chin-WookPhysics of plasmas, 2020-06, Vol.27 (6) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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5 |
Material Type: Artigo
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Hysteresis control using a DC magnetic field in an argon inductively coupled plasmaKim, Tae-Woo ; Lee, Moo-Young ; Chung, Chin-WookPhysics of plasmas, 2021-12, Vol.28 (12) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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6 |
Material Type: Artigo
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Control of the spatial distribution of ion flux in dual inductively coupled plasmasCho, Sung-Won ; Moon, Jun-Hyeon ; Zhang, Aixian ; Chung, Chin-WookJournal of applied physics, 2021-03, Vol.129 (10) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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7 |
Material Type: Artigo
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Effect of the RF bias on the plasma density in an argon inductively coupled plasmaLee, Ho-won ; Kim, Kyung-Hyun ; Seo, Jong In ; Chung, Chin-WookPhysics of plasmas, 2020-09, Vol.27 (9) [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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8 |
Material Type: Artigo
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Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasmaLee, Nayeon ; Kwon, Ohyung ; Chung, Chin-WookAIP advances, 2021-02, Vol.11 (2), p.025027-025027-8 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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9 |
Material Type: Artigo
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A wafer-like apparatus for two-dimensional measurement of plasma parameters and temperature distribution in low-temperature plasmasLim, Yeong-Min ; Eo, Hyundong ; Kim, Kyung-Hyun ; Lee, Moo-Young ; Chung, Chin-WookReview of scientific instruments, 2021-05, Vol.92 (5), p.053531-053531 [Periódico revisado por pares]Melville: American Institute of PhysicsTexto completo disponível |
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10 |
Material Type: Artigo
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Floating probe for electron temperature and ion density measurement applicable to processing plasmasLee, Min-Hyong ; Jang, Sung-Ho ; Chung, Chin-WookJournal of applied physics, 2007-02, Vol.101 (3), p.033305-033305-6 [Periódico revisado por pares]United States: American Institute of PhysicsTexto completo disponível |