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1
CSP-plant modeling guidelines and compliance of the system advisor model (SAM)
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CSP-plant modeling guidelines and compliance of the system advisor model (SAM)

Kesseli, Devon ; Wagner, Michael ; Guédez, Rafael ; Turchi, Craig S. Richter, Christoph

AIP Conference Proceedings, 2019, Vol.2126 (1) [Periódico revisado por pares]

Melville: American Institute of Physics

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2
Comparison of optical modelling tools for sunshape and surface slope error
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Comparison of optical modelling tools for sunshape and surface slope error

Wang, Ye ; Potter, Daniel ; Asselineau, Charles-Alexis ; Corsi, Clotilde ; Wagner, Michael ; Blanco, Manuel ; Kim, Jin-Soo ; Pye, John Mancilla, Rodrigo ; Richter, Christoph

AIP Conference Proceedings, 2018, Vol.2033 (1) [Periódico revisado por pares]

Melville: American Institute of Physics

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3
Experiments in detecting obscured objects using longwave infrared polarimetric passive imaging
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Experiments in detecting obscured objects using longwave infrared polarimetric passive imaging

Brown, Jarrod P ; Wagner, Michael C ; Roberts, Rodney G ; Card, Darrell B Krapels, Keith A ; Holst, Gerald C

SPIE 2019

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4
High-speed one-dimensional spatial light modulator for Laser Direct Imaging and other patterning applications
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High-speed one-dimensional spatial light modulator for Laser Direct Imaging and other patterning applications

Schmidt, Jan-Uwe ; Dauderstaedt, Ulrike A ; Duerr, Peter ; Friedrichs, Martin ; Hughes, Thomas ; Ludewig, Thomas ; Rudloff, Dirk ; Schwaten, Tino ; Trenkler, Daniela ; Wagner, Michael ; Wullinger, Ingo ; Bergstrom, Andreas ; Bjoernangen, Peter ; Jonsson, Fredrik ; Karlin, Tord ; Ronnholm, Peter ; Sandstrom, Torbjorn Piyawattanametha, Wibool ; Park, Yong-Hwa

SPIE 2014

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5
High absorbing resists based on trifluoromethacrylate-vinyl ether copolymers for EUV lithography
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High absorbing resists based on trifluoromethacrylate-vinyl ether copolymers for EUV lithography

Christianson, Matthew D ; Meyer, Matthew M ; Ongayi, Owendi ; Valeri, David ; Wagner, Michael Somervell, Mark H

Proceedings of SPIE, the international society for optical engineering, 2013, Vol.8682, p.868216-868216-11

SPIE

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6
Observations on passive polarimetric imaging across multiple infrared wavebands
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Observations on passive polarimetric imaging across multiple infrared wavebands

Saludez, Christian L ; Brown, Jarrod P ; Card, Darrell B ; Welsh, Chad M ; Wagner, Michael C Messinger, David W ; Velez-Reyes, Miguel

SPIE 2019

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7
Impact of Polymerization Process and OOB on Lithographic Performance of a EUV Resist
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Impact of Polymerization Process and OOB on Lithographic Performance of a EUV Resist

JAIN, Vipul ; COLEY, Suzanne M ; KWOK, Amy ; VALERI, David A ; THACKERAY, James W ; JUNG JUNE LEE ; CHRISTIANSON, Matthew D ; ARRIOLA, Daniel J ; LABEAUME, Paul ; DANIS, Maria E ; ORTIZ, Nicolas ; KANG, Su-Jin ; WAGNER, Michael D

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7969

Bellingham, Wash: SPIE

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8
ImpactMiner: a tool for change impact analysis
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ImpactMiner: a tool for change impact analysis

Dit, Bogdan ; Wagner, Michael ; Wen, Shasha ; Wang, Weilin ; Linares-Vásquez, Mario ; Poshyvanyk, Denys ; Kagdi, Huzefa

Companion Proceedings of the 36th International Conference on Software Engineering, 2014, p.540-543

New York, NY, USA: ACM

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9
Emotion recognition in the wild challenge 2013
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Emotion recognition in the wild challenge 2013

Dhall, Abhinav ; Goecke, Roland ; Joshi, Jyoti ; Wagner, Michael ; Gedeon, Tom

Proceedings of the 15th ACM on International conference on multimodal interaction, 2013, p.509-516

New York, NY, USA: ACM

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10
Optimization of low-diffusion EUV resist for linewidth roughness and pattern collapse on various substrates
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Optimization of low-diffusion EUV resist for linewidth roughness and pattern collapse on various substrates

Thackeray, James W ; Cameron, James F ; Wagner, Michael ; Coley, Suzanne ; Ongayi, Owendi ; Montgomery, Warren ; Lovell, Dave ; Biafore, John ; Chakrapani, Vidhya ; Ko, Akiteru Somervell, Mark H ; Wallow, Thomas I

SPIE 2012

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