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Mechanisms and processes of pulsed laser ablation in liquids during nanoparticle production
Mechanisms and processes of pulsed laser ablation in liquids during nanoparticle production
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Mechanisms and processes of pulsed laser ablation in liquids during nanoparticle production

DellʼAglio, M. ; Gaudiuso, R. ; De Pascale, O. ; De Giacomo, A.

Applied surface science, 2015-09, Vol.348, p.4-9 [Periódico revisado por pares]

Elsevier B.V

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2
Fabrication and droplet impact performance of superhydrophobic Ti6Al4V surface by laser induced plasma micro-machining
Fabrication and droplet impact performance of superhydrophobic Ti6Al4V surface by laser induced plasma micro-machining
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Fabrication and droplet impact performance of superhydrophobic Ti6Al4V surface by laser induced plasma micro-machining

Zhang, Zhen ; Liu, Denghua ; Zhang, Yi ; Xue, Tao ; Huang, Yu ; Zhang, Guojun

Applied surface science, 2022-12, Vol.605, p.154661, Article 154661 [Periódico revisado por pares]

Elsevier B.V

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3
A new laser-induced plasma electrolyte jet machining method: Efficient material removal mechanism and synergistic effects
A new laser-induced plasma electrolyte jet machining method: Efficient material removal mechanism and synergistic effects
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A new laser-induced plasma electrolyte jet machining method: Efficient material removal mechanism and synergistic effects

Yu, Mingxin ; Du, Liqun ; Wang, Fenglai ; Li, Aoqi ; Zhang, Ce

Journal of materials processing technology, 2024-05, Vol.326, p.118319, Article 118319 [Periódico revisado por pares]

Elsevier B.V

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4
Anisotropy of material removal during laser-induced plasma assisted ablation of sapphire
Anisotropy of material removal during laser-induced plasma assisted ablation of sapphire
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Anisotropy of material removal during laser-induced plasma assisted ablation of sapphire

Chen, Jialin ; Lu, Xizhao ; Li, Zhuo ; Wen, Qiuling ; Lu, Jing ; Jiang, Feng

Ceramics international, 2022-05, Vol.48 (10), p.13880-13889 [Periódico revisado por pares]

Elsevier Ltd

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5
Etching of SiC–SiC-composites by a laser-induced plasma in a reactive gas
Etching of SiC–SiC-composites by a laser-induced plasma in a reactive gas
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Etching of SiC–SiC-composites by a laser-induced plasma in a reactive gas

Zimmer, Klaus ; Ehrhardt, Martin ; Lorenz, Pierre ; Wang, Xi ; Wang, Pingping ; Sun, Shufeng

Ceramics international, 2022-01, Vol.48 (1), p.90-95 [Periódico revisado por pares]

Elsevier Ltd

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6
Effect of target on micromachining of sapphire using laser-induced plasma-assisted ablation
Effect of target on micromachining of sapphire using laser-induced plasma-assisted ablation
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Effect of target on micromachining of sapphire using laser-induced plasma-assisted ablation

Wen, Qiuling ; Chen, Jinhong ; Lu, Jing ; Mu, Dekui ; Jiang, Feng

Ceramics international, 2023-05, Vol.49 (9), p.14470-14477 [Periódico revisado por pares]

Elsevier Ltd

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7
UV femtosecond single-pulse and collinear double-pulse laser-induced breakdown spectroscopy (LIBS) for depth-resolved characterization of nano-scaled films
UV femtosecond single-pulse and collinear double-pulse laser-induced breakdown spectroscopy (LIBS) for depth-resolved characterization of nano-scaled films
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UV femtosecond single-pulse and collinear double-pulse laser-induced breakdown spectroscopy (LIBS) for depth-resolved characterization of nano-scaled films

Giannakaris, N. ; Siozos, P. ; Piñon, V. ; Banerjee, S.P. ; Sentis, M. ; Pedarnig, J.D. ; Anglos, D.

Applied surface science, 2023-12, Vol.640, p.158354, Article 158354 [Periódico revisado por pares]

Elsevier B.V

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8
High-order harmonics generation in nanosecond-pulses-induced plasma containing Ni-doped CsPbBr3 perovskite nanocrystals using chirp-free and chirped femtosecond pulses
High-order harmonics generation in nanosecond-pulses-induced plasma containing Ni-doped CsPbBr3 perovskite nanocrystals using chirp-free and chirped femtosecond pulses
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High-order harmonics generation in nanosecond-pulses-induced plasma containing Ni-doped CsPbBr3 perovskite nanocrystals using chirp-free and chirped femtosecond pulses

Konda, Srinivasa Rao ; Ganeev, Rashid A ; Kim, Vyacheslav V ; Ketavath, Ravi ; Yu, Jiaqi ; Li, Wei

Nanotechnology, 2023-01, Vol.34 (5) [Periódico revisado por pares]

IOP Publishing

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9
Laser microplasma as a spot tool for glass processing: Focusing conditions
Laser microplasma as a spot tool for glass processing: Focusing conditions
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Laser microplasma as a spot tool for glass processing: Focusing conditions

Rymkevich, Vladimir S. ; Sergeev, Maksim M. ; Zakoldaev, Roman A.

Journal of materials processing technology, 2021-06, Vol.292, p.117061, Article 117061 [Periódico revisado por pares]

Elsevier B.V

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10
Low surface damage laser processing of silicon by laser-induced plasma etching (LIPE)
Low surface damage laser processing of silicon by laser-induced plasma etching (LIPE)
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Low surface damage laser processing of silicon by laser-induced plasma etching (LIPE)

Heinke, Robert ; Ehrhardt, Martin ; Bauer, Jens ; Lotnyk, Andriy ; Lorenz, Pierre ; Morgenstern, Roy ; Lampke, Thomas ; Arnold, Thomas ; Zimmer, Klaus

Applied surface science, 2022-09, Vol.597, p.153712, Article 153712 [Periódico revisado por pares]

Elsevier B.V

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