Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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A multimaterial electrohydrodynamic jet (E-jet) printing systemSutanto, E ; Shigeta, K ; Kim, Y K ; Graf, P G ; Hoelzle, D J ; Barton, K L ; Alleyne, A G ; Ferreira, P M ; Rogers, J AJournal of micromechanics and microengineering, 2012-04, Vol.22 (4), p.45008-11 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
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2 |
Material Type: Artigo
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The influence of oxygen partial pressure on growth of the (Hg,Re)-1223 intergrain junctionOliveira, F.D.C. ; Passos, C.A.C. ; Fardin, J.F. ; Simonetti, D.S.L. ; Passamai, J.L. ; Belich, H. ; de Medeiros, E.F. ; Orlando, M.T.D. ; Ferreira, M.M.IEEE transactions on applied superconductivity, 2006-03, Vol.16 (1), p.15-20 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
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3 |
Material Type: Artigo
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Competitive and cost effective copper/low-k interconnect (BEOL) for 28 nm CMOS technologiesAUGUR, R ; CHILD, C ; QUON, R ; KIM, B ; SHENG, H ; HIROOKA, S ; GUPTA, R ; THOMAS, A ; SINGH, S. M ; FANG, Q ; SCHIWON, R ; HAMIEH, B ; AHN, J. H ; WORNYO, E ; ALLEN, S ; KALTALIOGLU, E ; RIBES, G ; ZHANG, G ; FRYXELL, T ; OGINO, A ; SHIMADA, E ; AIZAWA, H ; MINDA, H ; TANG, T. J ; KIM, S. O ; OKI, T ; FUJII, K ; PALLACHALIL, M ; TAKEWAKI, T ; HU, C. K ; SUNDLOF, B ; PERMANA, D ; BOLOM, T ; ENGEL, B ; CLEVENGER, L ; LABELLE, C ; SAPP, B ; NOGAMI, T ; SIMON, A ; SHOBHA, H ; GATES, S ; RYAN, E. T ; BONILLA, G ; DAUBENSPECK, T ; SHAW, T ; KIOUSSIS, D ; OSBORNE, G ; GRILL, A ; EDELSTEIN, D ; RESTAINO, D ; MOLIS, S ; SPOONER, T ; FERREIRA, P ; BIERY, G ; SAMPSON, R ; MASUDA, H ; SRIVASTAVA, R ; ODA, Y ; OGUMA, HMicroelectronic engineering, 2012-04, Vol.92, p.42-44 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
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4 |
Material Type: Artigo
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Optical absorption and band gap shift of n-doped AlxGa1−xAs alloys grown by MBEFerreira da Silva, A. ; Persson, C. ; Berggren, K.-F. ; Pepe, I. ; Santos Alves, A. ; de Oliveira, A.G.Microelectronic engineering, 1998-08, Vol.43-44, p.423-429 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |